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材料研究学报  2014, Vol. 28 Issue (9): 703-709    DOI: 10.11901/1005.3093.2013.131
  本期目录 | 过刊浏览 |
镁合金表面电化学沉积氢氧化镁薄膜及其耐蚀性能*
吴凤霞1,2,3,李维学1,2(),梁军3
1. 兰州理工大学省部共建有色金属先进加工与再利用国家重点实验室 兰州 730050
2. 兰州理工大学理学院 兰州 730050
3. 中国科学院兰州化学物理研究所固体润滑国家重点实验室 兰州 730000
Electrochemical Deposition and Corrosion Resistance of Mg(OH)2 Films on Magnesium Alloy
Fengxia WU1,2,3,Weixue LI1,2,**(),Jun LIANG3
1. State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou University of Technology, Lanzhou 730050
2. School of Science, Lanzhou University of Technology, Lanzhou 730050
3. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000
引用本文:

吴凤霞,李维学,梁军. 镁合金表面电化学沉积氢氧化镁薄膜及其耐蚀性能*[J]. 材料研究学报, 2014, 28(9): 703-709.
Fengxia WU, Weixue LI, Jun LIANG. Electrochemical Deposition and Corrosion Resistance of Mg(OH)2 Films on Magnesium Alloy[J]. Chinese Journal of Materials Research, 2014, 28(9): 703-709.

全文: PDF(3149 KB)   HTML
摘要: 

在室温条件下将AZ91D镁合金置于Mg(NO3)2 溶液中, 分别采用阴极恒电位和恒电位脉冲两种模式电化学沉积制备Mg(OH)2薄膜。用扫描电子显微镜(SEM)及X射线衍射(XRD)对薄膜进行微观形貌观察和物相结构分析, 用动电位极化方法研究了Mg(OH)2薄膜在3.5% NaCl溶液中的耐腐蚀性能。结果表明, 在两种条件下制备的Mg(OH)2薄膜表面均匀致密、没有明显的缺陷; 与用阴极恒电位沉积的Mg(OH)2薄膜相比, 用恒电位脉冲沉积的Mg(OH)2薄膜更均匀致密, 耐腐蚀性能更高。

关键词 材料失效与保护Mg(OH)2薄膜电化学沉积恒电位脉冲耐蚀性    
Abstract

Mg(OH)2 films were electrodeposited on the surface of AZ91D magnesium alloys in Mg(NO3)2 solutions at room temperature using cathodic potentiostatic and potentiostatic-pulse methods respectively. The characteristics of the Mg(OH)2 films were investigated by scanning electronic microscope (SEM) and X-ray diffraction (XRD). The corrosion resistance of the films was evaluated using potentiodynamic polarization tests. The results show that the Mg(OH)2 films are uniform and compact without obvious defects. Mg(OH)2 films enhanced the corrosion resistance of the AZ91D alloy. The Mg(OH)2 film deposited by potentiostatic pulse method was superior to that deposited by potentiostatic method in terms of uniformity and compactness and corrosion resistance.

Key wordsmaterials failure and protection    Mg(OH)2 films    electrochemical deposition    potentiostatic pulse    corrosion resistance
收稿日期: 2014-03-24     
基金资助:* 甘肃省科技计划1010RJZA045, 兰州理工大学博士基金和中国科学院“百人计划”资助项目。
Al Mn Zn Fe Si Ni Cu Mg
9.1 0.27 0.85 0.005 0.01 0.002 0.02 Remainder
表1  AZ91D镁合金的成分
图1  恒电位沉积和恒电位脉冲沉积电流密度随时间的变化曲线和局部放大图
图2  恒电位沉积和恒电位脉冲沉积薄膜的XRD谱
图3  恒电位沉积和恒电位脉冲沉积Mg(OH)2薄膜的宏观形貌
图4  恒电位沉积和恒电位脉冲沉积Mg(OH)2薄膜的表面SEM像
图5  恒电位沉积和恒电位脉冲沉积Mg(OH)2薄膜的截面SEM像
图6  AZ91D合金、恒电位沉积Mg(OH)2薄膜以及恒电位脉冲沉积Mg(OH)2薄膜在NaCl溶液中动电位极化曲线对比
Ecorr vs. Ag/AgCl/V Icorr /Acm?2
Uncoated AZ91D alloy ?1.39 4.23×10-5
Coated Mg(OH)2 films (potentiostatic deposition) ?1.34 5.36×10-6
Coated Mg(OH)2 films (potentiostatic pulse deposition) -1.26 7.49×10-7
表2  腐蚀电位(Ecorr)和腐蚀电流密度(Icorr)
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