|
|
|
| 聚甲基硅氧烷纳米多孔薄膜的微孔结构分析 |
| 高芳亮1, 李生英1, 陈宏基1, 吴忠华2, 李志宏2 |
1.暨南大学理工学院材料科学与工程系 广州 510632
2.中国科学院高能物理研究所同步辐射国家实验室 北京 100049 |
|
| Pore Structural Analysis on Poly(Methyl)silsesquioxane Porous Thin Films by Synchrotron Radiation Small Angle X–ray Scattering |
| GAO Fangliang1, LI Shengying1, CHEN Hongji1, WU Zhonghua2, LI Zhihong2 |
1.Department of Material Science & Engineering, Jinan University, Guangzhou 510632
2.Beijing Synchrotron Radiation Laboratory, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049 |
引用本文:
高芳亮 李生英 陈宏基 吴忠华 李志宏. 聚甲基硅氧烷纳米多孔薄膜的微孔结构分析[J]. 材料研究学报, 2012, 26(1): 68-72.
.
Pore Structural Analysis on Poly(Methyl)silsesquioxane Porous Thin Films by Synchrotron Radiation Small Angle X–ray Scattering[J]. Chin J Mater Res, 2012, 26(1): 68-72.
| 1 R.H.Baney, Maki Itoh, A.Sakakibara, T.Suzuki, Silsesquioxanes, Chem. Rev., 95(5), 1409(1995)2 K.Maex, M.R.Baklanov, D.Shamiryan, F.Iacopi, S.H.Brongersma, Z.S.Yanovitskaya, Low dielectric constant materials for microelectronics, J. Appl. Phys., 93(11), 8793(2003)3 K.Xi, H.He, D.Xu, R.Ge, Z.Meng, X.Jia, X.Yu, Ultra low dielectric constant polysilsesquioxane films using T8(Me4NO)8 as porogen, Thin Solid Films, 518(17), 4768(2010)4 HU Yifan, ZHANG Ying, FU Danrong, The preparation and characterization of porous low dielectric constant oligomeric–MSSQ film, Journal of Huazhong University of Science and Technology (Natural Science Edition), 36(2), 104(2008)(胡一帆, 章瑛, 付丹蓉, 低介电常数甲基倍半硅氧烷多孔膜的制备及表征, 华中科技大学学报(自然科学版), 36(2), 104(2008))5 J.R.Levine, J.B.Cohen, Y.W.Chung, P.Georgopoulos, Grazing–incidence small–angle X–ray scattering: new tool for studying thin film growth, J. Appl. Cryst., 22(6), 528(1989)6 H.J.Chen, S.Y.Li, X.J.Liu, R.P.Li, D.Smilgies, Z.H.Wu, Z.H.Li, Evaluationon pore structures of organosilicate thin films by grazing incidence small–angle X–ray scattering, J. Phys. Chem. B, 113(38), 12623(2009)7 H.J.Chen, M.Fu, Core–shell–shaped organic–inorganic hybrid as pore generator for imprinting nanopores in organosilicate dielectric films, Macromolecules, 40(6), 2079(2007)8 C.Meng, Background correction of the SAXS intensities scattered by semicrystalline materials, J. Appl. Cryst., 25(5), 646(1992)9 X.S.Zhang, S.M.Chen, L.H.Shi, Studies on regularity of poly phenylsilsesquioxane chains, Chinese Journal of Polymer Science, 5(2),162(1987)10 G.Porod, Die rontgenkleinwinkelstreuung von dichtgepackten kolloiden systemen, Kolloid Z., 124(2), 83(1951)11 LI Zhihong, ZHAO Junping, WU Dong, SUN Yuhan, WANG Jun, LIU Yi, SHENG Wenjun, DONG Baozhong, A positive deviation from Porod’s law in SAXS of porous ZrO2 xerogels, Acta Chimica Sinica, 58(9), 1147(2000)(李志宏, 赵军平, 吴东, 孙予罕, 王俊, 柳义, 生文君, 董宝中, 小角X射线散射中Porod正偏离的校正, 化学学报, 58(9), 1147(2000))12 G.Walter, R.Kranold, T.Gerber, J.Baldrian, M.Steinhart, Particle size distribution from small–angle X–ray scattering data, J. Appl. Cryst., 18(4), 205(1985)13 A.Guinier, G Fournet, Small–angle Scattering of X–rays, (New York, John Wiley and Sons, Ions, Inc, 1955) p.2414 K.D.Keefer, D.W.Schaefer, Growth of fractally rough colloids, Phys. Rev. Lett., 56(22), 2376(1986)15 P.J.McMahon, S. D. Moss, Derivation of infinite–slit–smeared small–angle scattering from porous surface and porous mass fractals, J. Appl. Cryst., 32(5), 956(1999) |
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
| |
Shared |
|
|
|
|
| |
Discussed |
|
|
|
|
