Thermal stability of nano--structure Ti--Si--N coatings at elevated temperature

Chin J Mater Res

2004, Vol. 18

Issue (6): 617-622 DOI:

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Thermal stability of nano--structure Ti--Si--N coatings at elevated temperature

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西安交通大学

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;. Thermal stability of nano--structure Ti--Si--N coatings at elevated temperature. Chin J Mater Res, 2004, 18(6): 617-622.

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Abstract The super--hard nanocomposite films of Ti--Si--N were prepared by direct current plasma enhanced chemical vapor deposition (PCVD) on strain--less steel substrate. Dependence of Si content and annealing at elevated temperatures on the microstructure and hardness of Ti--Si--N coatings were investigated. The results showed that plastic hardness increased with increasing the Si content and then decreased in these films. The maximum value hardness of exceeding 70 GPa can be achieved. Furthermore, the films show a superiority thermal stability. To as--received coatings of 4 nm crystallite size, the microhradness and crystallite size remain stable even at 1000℃. it was found that recrystallization temperature mainly depends on crystallite size of as--received films. The possible origin of high thermal stability of superhard nanocomposite was discussed. The results are explained by spinodal decomposition that occurs during deposition.

Key words: inorganic non-metallic materials nanocomposite films PCVD hardness thermal stability

Received: 29 December 2004

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