轴对称磁场对电弧离子镀TiN-Cu纳米复合膜性能的影响

doi:10.11901/1005.3093.2014.599

材料研究学报

2015, Vol. 29

Issue (10): 787-793 DOI: 10.11901/1005.3093.2014.599

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轴对称磁场对电弧离子镀TiN-Cu纳米复合膜性能的影响

宋贵宏¹(

),肖金泉²,杜昊²,陈立佳¹

1. 沈阳工业大学材料科学与工程学院沈阳 110870
2. 中国科学院金属研究所材料表面工程研究部沈阳 110016

Influence of Axisymmetric Magnetic Field on Properties of TiN-Cu Nanocomposite Films Prepared by Arc Ion Plating

Guihong SONG^1,^**(

),Jinquan XIAO²,Hao DU²,Lijia CHEN¹

1. School of Material Science and Technology, Shenyang University of Technology, Shenyang 110870, China
2. Division of surface engineering of materials, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China

引用本文:

宋贵宏,肖金泉,杜昊,陈立佳. 轴对称磁场对电弧离子镀TiN-Cu纳米复合膜性能的影响[J]. 材料研究学报, 2015, 29(10): 787-793.
Guihong SONG, Jinquan XIAO, Hao DU, Lijia CHEN. Influence of Axisymmetric Magnetic Field on Properties of TiN-Cu Nanocomposite Films Prepared by Arc Ion Plating[J]. Chinese Journal of Materials Research, 2015, 29(10): 787-793.

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摘要:

在电弧离子镀靶后端加入轴对称线圈磁场, 制备了TiN-Cu纳米复合膜。观察线圈磁场强度对靶表面电弧斑点游动速率和弧柱形状的影响, 及其对沉积薄膜的表面形貌、沉积速率、纳米压痕硬度和弹性模量的影响。结果表明, 提高线圈磁场强度可提高电弧斑点的游动速率, 进而降低靶表面金属液滴喷射几率, 减小沉积薄膜中大颗粒的尺寸和数量。X射线衍射(XRD)谱显示, 沉积薄膜只含有TiN相, 未出现金属Cu或其化合物的衍射峰; 薄膜呈现明显的(111)晶面择优取向。随着线圈磁场强度的提高薄膜沉积速率、压痕硬度和弹性模量先增加, 达到最大值后又略有减少, 其最大硬度和弹性模量分别达到35.46 GPa和487.61 GPa。

关键词 ：复合材料, TiN-Cu纳米复合膜, 硬度, 电弧离子镀, 磁场强度, 大颗粒, 沉积速率

Abstract：

TiN-Cu nanocomposite films were deposited on high speed steel by arc ion plating with an axisymmetric coil magnetic field at the back of the target. The influence of the coil magnetic field intensity on the moving rate of cathode spot and arc column shape on the target surface, as well as on the surface morphology, deposition rate, nanoindentation hardness and elastic modulus of the deposits was investigated. It is shown that the emitting probability of the melt metal drops on the target decreases, and the size and quantity of the macroparticles in the deposited films reduces with the increasing coil magnetic field intensity. The deposited films consists merely of TiN phase without metal Cu phase or Cu compound and possess an obvious preferred orientation along (111) plane. The deposition rate, indentation hardness and elastic modulus of the films increase rapidly to a maximum value and then decrease slightly with the increasing coil magnetic field intensity. The maximum values of hardness and elastic modulus are 35.46 GPa and 487.61 GPa, respectively.

Key words： composites TiN-Cu nanocomposite film hardness arc ion plating magnetic field intensity macroparticle deposition rate

收稿日期: 2014-10-17

基金资助:* 国家自然科学基金51171197及广东省产学研合作重大专项2013A090100003资助项目。

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https://www.cjmr.org/CN/10.11901/1005.3093.2014.599 或 https://www.cjmr.org/CN/Y2015/V29/I10/787

图1 磁场线圈和电弧离子镀装置的示意图

图2 电弧离子镀阴极靶表面的弧斑游动

图3 电弧离子镀阴极靶附近弧柱形状

图4 不同磁场强度下沉积薄膜的表面形貌

图5 不同磁场强度下薄膜的横截面形貌

图6 不同线圈磁场强度下沉积膜的XRD谱

表1 沉积膜的织构系数与线圈磁场强度的关系

图7 沉积膜的压痕硬度与线圈磁场强度的关系

图8 沉积膜的弹性模量与线圈磁场强度的关系

图9 沉积膜的压痕硬度与弹性模量比值(H/E)与线圈磁场强度的关系

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