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| 快速热退火对多层Ge量子点晶体质量的影响 |
| 魏榕山, 丁晓琴, 何明华 |
| 福州大学物理与信息工程学院 福州 350108 |
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| Influence of Rapid Thermal Annealing on Ge Quantum Dots Crystal Quality |
| WEI Rongshan, DING Xiaoqin, HE Minghua |
| College of Physics and Information Engineering, Fuzhou University, Fuzhou 350108 |
引用本文:
魏榕山 丁晓琴 何明华. 快速热退火对多层Ge量子点晶体质量的影响[J]. 材料研究学报, 2011, 25(3): 259-262.
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Influence of Rapid Thermal Annealing on Ge Quantum Dots Crystal Quality[J]. Chin J Mater Res, 2011, 25(3): 259-262.
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