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| 脉冲偏压对矩形平面大弧源离子镀TiN膜层性能的影响 |
| 林永清;巩春志;魏永强;田修波;杨士勤;关秉羽;于传跃 |
| 哈尔滨工业大学材料学院 |
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| Influence of Pulsed Bias Voltage on Surface Properties of TiN Thin Films Deposited by Arc Ion Plating with Big Rectangle Shaped Targets |
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引用本文:
林永清; 巩春志; 魏永强; 田修波; 杨士勤; 关秉羽; 于传跃 . 脉冲偏压对矩形平面大弧源离子镀TiN膜层性能的影响[J]. 材料研究学报, 2008, 22(4): 399-404.
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Influence of Pulsed Bias Voltage on Surface Properties of TiN Thin Films Deposited by Arc Ion Plating with Big Rectangle Shaped Targets[J]. Chin J Mater Res, 2008, 22(4): 399-404.
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