结构调制超硬Ti/TiN纳米多层膜的制备及其尺寸效应

doi:10.11901/1005.3093.2018.343

材料研究学报

2019, Vol. 33

Issue (2): 138-144 DOI: 10.11901/1005.3093.2018.343

本期目录 | 过刊浏览

结构调制超硬Ti/TiN纳米多层膜的制备及其尺寸效应

杨波波,孙珲(

),杨田林(

),郑小龙,徐涛,李方正,宋淑梅

山东大学(威海)空间科学与物理学院威海 264209

Preparation of Structure-Modulated Superhard Ti/TiN Nano-Multilayers and Size Effect

Bobo YANG,Hui SUN(

),Tianlin YANG(

),Xiaolong ZHENG,Tao XU,Fangzheng LI,Shumei SONG

School of Space Science and Physics, Shandong University Weihai, Weihai 264209, China

引用本文:

杨波波,孙珲,杨田林,郑小龙,徐涛,李方正,宋淑梅. 结构调制超硬Ti/TiN纳米多层膜的制备及其尺寸效应[J]. 材料研究学报, 2019, 33(2): 138-144.
Bobo YANG, Hui SUN, Tianlin YANG, Xiaolong ZHENG, Tao XU, Fangzheng LI, Shumei SONG. Preparation of Structure-Modulated Superhard Ti/TiN Nano-Multilayers and Size Effect[J]. Chinese Journal of Materials Research, 2019, 33(2): 138-144.

全文: PDF(7869 KB) HTML

摘要:

使用多弧离子镀技术在高速钢基体上制备了调制周期为5~40 nm的Ti/TiN纳米多层膜，用扫描电子显微镜(SEM)、X射线能谱仪(EDS)、X射线衍射仪(XRD)、纳米压痕仪和划痕仪等手段表征薄膜的微观结构和性能，研究了调制周期对Ti/TiN纳米多层膜性能的影响，并讨论了在小调制周期条件下Ti/TiN纳米多层膜的超硬效应和多弧离子镀技术对纳米多层膜硬度的强化作用。结果表明，与单层TiN相比，本文制备的Ti/TiN纳米多层膜分层情况良好，薄膜均匀致密，没有明显的柱状晶结构，TiN以面心立方结构沿(111)方向择优生长。随着调制周期的减小薄膜的硬度呈现先增大后减小的趋势，并在调制周期为7.5 nm时具有最大的硬度42.9 GPa和H/E值。这表明，Ti/TiN在具有最大硬度的同时仍然具有良好的耐磨性和韧性。Ti/TiN纳米多层膜的附着力均比单层TiN薄膜的附着力高，调制周期为7.5 nm时多层膜的附着力为(58±0.9) N。

关键词 ：金属材料, 纳米多层膜, Ti/TiN, 多弧离子镀, 小调制周期, 超硬效应

Abstract：

Multilayered films Ti/TiN with 5~40 nm modulation period were prepared on a high-speed steel substrate by multi-arc ion plating technology. The microstructure and mechanical property of the films were characterized by means of scanning electron microscopy (SEM), X-ray energy dispersive spectrometer (EDS), X-ray diffraction (XRD), nanoindentation and scratch test. The effect of modulation period on the performance of multilayered films Ti/TiN was investigated. Results show that the multilayered films Ti/TiN are uniform and dense with lamellar structure but without obvious features of columnar structure. TiN film is preferentially grown along the (111) direction. The film hardness increases firstly and then decreases with the decrease of the modulation period. The maximum hardness of 42.9 GPa and the maximum H/E value werer obtained when the modulation period is 7.5 nm, which indicates that the film possesses good combination of wear resistance and toughness. In addition, the adhesion of the multilayered films Ti/TiN is generally higher than that of the single-layered TiN film. When the modulation period is 7.5 nm, multilayered films Ti/TiN present a relatively high adhesion of (58±0.9) N.

Key words： metallic materials nano-multilayer Ti/TiN multi-arc ion plating small modulation period superhard effect

收稿日期: 2018-05-23

ZTFLH:

TG148

基金资助:山东省自然科学基金(ZR2018QEM002);山东大学(威海)青年学者未来计划

作者简介: 杨波波，男，1993年生，硕士生

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https://www.cjmr.org/CN/10.11901/1005.3093.2018.343 或 https://www.cjmr.org/CN/Y2019/V33/I2/138

图1 设备结构简图和桶装置功能示意图

图2 Ti/TiN纳米多层膜的结构示意图

图3 单层TiN薄膜和2# Ti/TiN纳米多层膜截面的SEM照片

图4 不同调制周期的Ti/TiN纳米多层膜截面的SEM照片

表1 Ti/TiN纳米多层膜的薄膜参数

图5 不同调制周期的Ti/TiN纳米多层膜的XRD谱

图6 Ti/TiN纳米多层膜的纳米硬度和弹性模量与调制周期的关系

图7 分别基于调制周期和较大晶粒尺寸计算出的Hall-Petch参数

表2 单层TiN薄膜和Ti/TiN纳米多层膜的硬度、弹性模量和H/E值

图8 不同调制周期的Ti/TiN纳米多层膜的膜基结合力

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