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材料研究学报  2016, Vol. 30 Issue (4): 277-284    DOI: 10.11901/1005.3093.2015.428
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高能W6+预辐照对钨表面微结构的影响
杨铭, 范红玉(), 解晓东, 郭一鸣, 刘云鹤, 李坤
大连民族大学物理与材料工程学院 大连 116600
Effect of High Energy W6+ Pre-implantation on Surface Microstructure of Tungsten Irradiated by Low-energy Hydrogen Ions
YANG Ming, FAN Hongyu**(), XIE Xiaodong, GUO Yiming, LIU Yunhe, LI Kun
School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China
引用本文:

杨铭, 范红玉, 解晓东, 郭一鸣, 刘云鹤, 李坤. 高能W6+预辐照对钨表面微结构的影响[J]. 材料研究学报, 2016, 30(4): 277-284.
Ming YANG, Hongyu FAN, Xiaodong XIE, Yiming GUO, Yunhe LIU, Kun LI. Effect of High Energy W6+ Pre-implantation on Surface Microstructure of Tungsten Irradiated by Low-energy Hydrogen Ions[J]. Chinese Journal of Materials Research, 2016, 30(4): 277-284.

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摘要: 

利用低能H离子对20 MeV W6+ 预注入和未注入的钨样品进行辐照实验, 考察H离子能量(20-520 eV)和辐照温度(673-1073 K)变化对钨表面微结构的影响。采用非破坏性的导电模式原子力显微镜和扫描电镜分析预注入和未注入钨样品的表面形貌和内表面缺陷分布情况。结果表明, 辐照后的样品表面出现大量的纳米尺寸凸起, 高能W6+预注入的样品表面损伤要小于未注入的钨样品, 意味着高能离子预注入会对材料的表面损伤起到抑制作用, 但是当辐照温度高于1073 K时, 这种抑制作用开始减弱。

关键词 金属材料导电原子力显微镜表面损伤辐照    
Abstract

Bare and high-energy (20 MeV) W6+ pre-implanted polycrystalline tungsten samples were irradiated with low-energy H-ions. The effect of H-ions energy (20-520 eV) and irradiation temperature (673-1073 K) on the microstructure evolution of these samples was characterized by means of non-destructive conductive atomic force microscopy and scanning electron microscopy in terms of the surface morphology and distribution of irradiation induced defects. The results show that a large number of nanometer-sized protuberances were formed on the irradiated tungsten samples, but the irradiation induced damage for the pre-implanted ones was slighter than the bare ones. For pre-implanted samples, low-energy H ions irradiation results in a random distribution of nanometer-sized protuberances, indicating that high-energy W6+ implantation can release the surface damage of tungsten induced by low-energy H ions to some extent. It also showed that the release effect was decreased when the irradiation temperature was higher than 1073 K.

Key wordsmetallic materials    tungsten    conductive atomic force microscope    surface damage    irradiation
收稿日期: 2015-07-27     
ZTFLH:  O77  
基金资助:国家自然科学基金项目11405023,辽宁省教育厅一般科研项目L2014539,辽宁省大学生创新创业训练项目S201512026068和大连民族大学“太阳鸟”学生科研项目tyn2015302资助
作者简介: 本文联系人: 范红玉
图1  CAFM测得的不同能量的H离子辐照后钨样品的表面形貌(左图)和电流分布图像(右图)
图2  CAFM测得的不同能量的H离子辐照W6+预注入的钨样品的表面形貌(左图)和电流分布图像(右图)
图3  CAFM测得的不同温度下H离子辐照后钨样品的表面形貌(左图)和电流分布图像(右图)
图4  CAFM测得的不同温度下H离子辐照W6+预注入的钨样品的表面形貌(左图)和电流分布图像(右图)
图5  H 离子辐照后的钨样品表面形貌的SEM像
图6  H 离子辐照W 6+预注入钨样品的表面形貌的SEM像
图7  表面粗糙度随辐照离子能量和温度的变化曲线
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