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表面纳米化硅钢薄带的低温渗硅与参数的影响* |
刘刚1( ),莫成刚1,沙玉辉2,赵骧2,左良2 |
1. 东北大学研究院 沈阳 110819 2. 东北大学 材料电磁过程研究教育部重点实验室 沈阳 110819 |
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Low-temperature Siliconizing of Silicon Steel Thin Strip with a Nanostructured Surface Layer and Effect of Treatment Parameter |
Gang LIU1,**( ),Chenggang MO1,Yuhui SHA2,Xiang ZHAO2,Liang ZUO2 |
1. Research Academy, Northeastern University, Shenyang 110819, China 2. Key Laboratory of Electromagnetic Processing of Materials, Ministry of Education, Northeastern University, Shenyang 110819, China |
引用本文:
刘刚,莫成刚,沙玉辉,赵骧,左良. 表面纳米化硅钢薄带的低温渗硅与参数的影响*[J]. 材料研究学报, 2015, 29(5): 359-364.
Gang LIU,
Chenggang MO,
Yuhui SHA,
Xiang ZHAO,
Liang ZUO.
Low-temperature Siliconizing of Silicon Steel Thin Strip with a Nanostructured Surface Layer and Effect of Treatment Parameter[J]. Chinese Journal of Materials Research, 2015, 29(5): 359-364.
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