材料研究学报  2011, Vol. 25 Issue (5): 476-482

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Ta--7.5%W合金箔材的冷轧变形织构与微观结构

王珊, 汪明朴, 陈畅, 夏福中, 杨巧然

中南大学材料科学与工程学院 长沙 410083

The Microstructures and Textures of the Cold–rolled Ta–7.5%W Alloy Foils

WANG Shan, WANG Mingpu, CHEN Chang, XIA Fuzhong, YANG Qiaoran

School of Material Science and Engineering, Central South University, Changsha 410083

王珊 汪明朴 陈畅 夏福中 杨巧然. Ta--7.5%W合金箔材的冷轧变形织构与微观结构[J]. 材料研究学报, 2011, 25(5): 476-482.
, , , , . The Microstructures and Textures of the Cold–rolled Ta–7.5%W Alloy Foils[J]. Chin J Mater Res, 2011, 25(5): 476-482.

摘要 参考文献 相关文章 Metrics 全文: PDF(950 KB)   摘要: 研究了140 μm的Ta--7.5%W合金箔材在冷轧变形前后的织构和微观组织, 结果表明: 冷轧态和退火态的Ta--7.5%W合金箔材中主要形成了{001}<110>、{113}<110>、{112}<110>、{111}<110>四种织构组分; 在冷轧的Ta--7.5%W合金箔材中, 合金的{100}<110>取向和{113}<110>取向的晶粒中都形成了位错胞结构, 且在{100}<110>方向上主要为大的等轴状位错胞结构, 位错胞的平均大小在500 nm左右, 而在{111}<110>取向形成了微带组织, 这些微带互相平行, 微带之间的平均间距在200 nm左右; 微带主要由GNBs(geometrically necessary boundaries, 几何必须位错界面)和IDBs(incidental dislocation boundaries, 附生位错界面)两种位错界面结构组成, GNBs中含有一组相互平行的高密度位错, 位错之间的间距在5 nm左右。 关键词 ： 金属材料,  冷轧,  Ta--W合金,  织构,  变形组织     Abstract：The microstructure and texture in both the annealing and cold–rolled conditions of 140 μm Ta–7.5%W alloy foils were investigated by TEM and orientation distribution function (ODF) analysis. It is found that the main texture components of the annealing and cold–rolled Ta–7.5%W alloys are {001}<110>,  {113}<110>,  {112}<110> and {111}<110>. In the cold–rolled Ta–7.5%W alloy foils, the dislocation cell structures were formed in both {001}<110> and {113}<110> orientations. There were a lot of equiaxed cell structures with an average size of 500 nm in the grains of {001}<110> texture. The microband structures were developed in the {111}<110> grains, which are distributed parallelly in the grains with a mean space length of 200 nm. The microbands consist of GNBs and IDBs. In the GNBs, there were a set of high density parallel dislocations with the spacing of about 5 nm. Key words： metallic materials    cold–rolled    Ta–W alloy    textures    deformation structures 收稿日期: 2011-06-29      ZTFLH:  TG146   基金资助: 国家高新技术研究发展计划2006AA03Z517和湖南省自然科学基金05JJ30095资助项目。 服务 把本文推荐给朋友 加入引用管理器 E-mail Alert RSS 作者相关文章 王珊 汪明朴 陈畅 夏福中 杨巧然 44.8K 链接本文: https://www.cjmr.org/CN/      或      https://www.cjmr.org/CN/Y2011/V25/I5/476 1 W.Ensinger, Ion–beam sputter coating of tantalum tube inner walls for protection against hydrogen embrittlement, Surface and Coatings Technology, 84(1), 434(1996) 2 F.Cardarlli, P.Taxil, A.Sayall, Tantalum protective thin coating techniques for the chemical process industry: Molten salts electrocoating as a new alternative, International Journal of Refractory Metals and Hard Materials, 14(5), 365(1996) 3 T.Laurila, K.Zeng, J.K.Kivilahti, J.Molarius, T.Riekkinen, I.Suni, Tantalum carbide and nitride diffusion barriers for Cu metallization, Microelectronic Engineering, 60(1), 71(2002) 4 S.Li, H.S.Park, M.H.Liang, T.H.Yip, O.Prabhakar, Effects of Cu diffusion behaviors on electronic property of Cu/Ta/SiO2/ Si structure, Thin Solid Films, 462–463, 192(2004) 5 T.Balaji, R.Govindaiah, M.K.Sharma, Y.Purnshotan, A. 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