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材料研究学报  2009, Vol. 23 Issue (4): 426-430    
  研究论文 本期目录 | 过刊浏览 |
基于磁控溅射制备纳米微晶NiOx薄膜的方法
王怀义1;2; 刁训刚1; 王武育3; 郝维昌1; 王聪1;  王天民1
1.北京航空航天大学理学院 北京 100083
2.北京印刷学院基础部 北京 102617
3.北京有色金属研究总院 北京 100088
A novel means for preparing nano-microcrystalline NiOx films by magnetron sputtering
WANG Huaiyi1;2; DIAO Xungang 1;  WANG Wuyu 3; HAO Weichang 1; WANG Cong 1;  WANG Tianmin 1
1.School of Science; Beihang University; 100083 Beijing
2.Science Education Department; Beijing Institute of Graphic Communication; 102600 Beijing
3.General Research Institute for Non-ferrous Metals; 100088 Beijing
引用本文:

王怀义 刁训刚 王武育 郝维昌 王聪 王天民. 基于磁控溅射制备纳米微晶NiOx薄膜的方法[J]. 材料研究学报, 2009, 23(4): 426-430.
, , , , . A novel means for preparing nano-microcrystalline NiOx films by magnetron sputtering[J]. Chin J Mater Res, 2009, 23(4): 426-430.

全文: PDF(946 KB)  
摘要: 

使用一种配套于磁控溅射设备的基片液氮冷却装置制备了小颗粒度纳米微晶NiOx电致变色薄膜. 当溅射参数完全相同时, 借助于对基片的冷却可有效控制并降低NiOx薄膜的晶粒尺度. 冷却基片所制备的NiOx薄膜的电致变色性能明显优于室温时制备的薄膜, 且该薄膜的O/Ni比率也明显高于室温时制备的NiOx薄膜的O/Ni比率.

关键词 无机非金属材料磁控溅射纳米微晶态电致变色NiOx薄膜    
Abstract

NiOx electrochromic films with small grain size (<22 nm) have been prepared by using a liquid-nitrogen-cooled apparatus with a magnetron sputtering installation being equipped. When identical deposition parameters have been employed, relying on liquid nitrogen cooling substrates, the grain sizes of films can be controlled and reduced. The results showed that the electrochromic performance and the O/Ni rate of NiOx film prepared with cooling substrate were superior to that of NiOx film deposited without cooling substrate.

Key wordsinorganic non-metallic materials    magnetron sputtering    nano-microcrystalline state    electrochromism    NiOx film
收稿日期: 2008-10-06     
ZTFLH: 

O484

 
基金资助:

国家重点基础研究发展计划2007CB936300资助项目.

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