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退火工艺对射频磁控溅射Bi:YIG薄膜磁性能的影响 |
青慧; 张怀武; 刘颖力; 文岐业 |
电子科技大学电子薄膜与集成器件国家重点实验室 |
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引用本文:
青慧; 张怀武; 刘颖力; 文岐业 . 退火工艺对射频磁控溅射Bi:YIG薄膜磁性能的影响[J]. 材料研究学报, 2008, 22(2): 187-190.
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