Anti-oxidation Perfromamnce of Thin Film Thermocouple at High Temperature

doi:10.11901/1005.3093.2015.755

Chinese Journal of Materials Research

2017, Vol. 31

Issue (2): 123-128 DOI: 10.11901/1005.3093.2015.755

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Anti-oxidation Perfromamnce of Thin Film Thermocouple at High Temperature

Chaojie WANG^1,²,Peng CHEN³(

),Guangmin YUAN⁴,Bo WANG⁵

1 National university of defense technology College of aerospace science and engineering, Changsha 410073, China
2 National Key Laboratory of Science and Technology on Nearspace Vehicle Technology, Beijing 10076, China
3 R&D center, The 44th Institute of CASC, Xi'an 710025, China
4 Ministry of Education Key Laboratory of Micro and Nano Systems for Aerospace, Northwestern Polytechnical University, 127 West Youyi Road, Xi′an 710072, China
5 Beijing No.8 High School, Beijing 100033, China

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Chaojie WANG,Peng CHEN,Guangmin YUAN,Bo WANG. Anti-oxidation Perfromamnce of Thin Film Thermocouple at High Temperature. Chinese Journal of Materials Research, 2017, 31(2): 123-128.

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Abstract

The thin-film thermocouple of NiCr-NiSi without and with protective coatings of SiO₂ and SiO_xN_y were respectively manufactured by magnetron sputtering method. Then their oxidation performance was examined at 100~800℃ for 90 mim in air. The results show that the anti-oxidation capacity of the thermocouple with SiO_xN_y coating is 3~5 times higher than that with SiO₂ coating at 800℃ according to the intensities of the diffraction peaks of NiO in XRD spectra of the above two thermocouples. Meanwhile, the slightly oxidization of SiO_xN_y coating during high temperature process can effectively enhance its protectiveness as well.

Key words: surface and interface in the materials thin-film thermocouple high-temperature oxidation SiOxNy protective film

Received: 23 December 2015

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	Chaojie WANG
	Peng CHEN
	Guangmin YUAN
	Bo WANG

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https://www.cjmr.org/EN/10.11901/1005.3093.2015.755 OR https://www.cjmr.org/EN/Y2017/V31/I2/123

Fig.1 Structure schematic of the thin film thermocouple

Fig.2 Schematic diagram of the local structure of SiO_xN_y

Fig.3 Fabrication process of the samples

Fig.4 XRD patterns of NiSi thin films after annealing at different temperatures

Fig.5 Surface morphologies of NiSi thin films after annealing at different temperatures (a) below 300℃,(b) 500℃

Fig.6 XRD patterns of the thin film thermocouple with different protection films after annealing at 800℃ (a) the sample with SiO_xN_y protective film,(b) the sample with SiO₂ protective film

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