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| Promotion Effect of α-Al2O3 Seeds on Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering |
LI Xiuxian, QIU Wanqi( ), JIAO Dongling, ZHONG Xichun, LIU Zhongwu |
| School of Materials Science and Engineering, South China University of Technology, Guangzhou 510640, China |
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Cite this article:
LI Xiuxian, QIU Wanqi, JIAO Dongling, ZHONG Xichun, LIU Zhongwu. Promotion Effect of α-Al2O3 Seeds on Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering. Chinese Journal of Materials Research, 2022, 36(1): 8-12.
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Abstract The films of corundum structure Al2O3 were successfully deposited on gold foil with pre-deposited α-Al2O3 seeds at low-temperature by reactive RF (Radio Frequency) sputtering with Al+α-Al2O3(15% α-Al2O3) target. The surface morphology, phase constituent and chemical composition of the as-deposited films were characterized by SEM, GIXRD and EDS. Results show that films of single α-Al2O3 with corundum-like crystallographic structure could be deposited at 560℃ on Si(100) substrate by reactive sputtering with Al+α-Al2O3 as composite target, while the substrate temperature even could be reduced to 500℃ for gold foil with pre-deposited α-Al2O3 seeds (the density of α-Al2O3 seeds is ~106/cm2) by reactive sputtering with pure Al as target. The results of the above two deposition methods proved that α-Al2O3 seeds may be favorable for the deposition of single phase α-Al2O3 films on the substrate at lower temperature.
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Received: 19 April 2021
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| Fund: National Natural Science Foundation of China(51971095);Guangdong Natural Science Foundation(2020A1515011087) |
About author: QIU Wanqi, Tel: 13924233479, E-mail: mewqqiu@scut.edu.cn
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