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Effect of PEG6000 on Electroless Copper in Dual-Ligands System |
LU Jianhong1,2,DENG Xiaomei3,YAN Jianhui3,TU Jiguo1,WANG Mingyong1( ),JIAO Shuqiang1( ) |
1. State Key Laboratory of Advanced Metallurgy, University of Science and Technology Beijing, Beijing 100083, China 2. Changzhou Institutes of Advanced Materials, Beijing University of Chemical Technology, Changzhou 213164, China 3. School of Chemistry and Chemical Engineering, Hunan Institute of Science and Technology, Yueyang 414006, China |
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Cite this article:
LU Jianhong, DENG Xiaomei, YAN Jianhui, TU Jiguo, WANG Mingyong, JIAO Shuqiang. Effect of PEG6000 on Electroless Copper in Dual-Ligands System. Chinese Journal of Materials Research, 2019, 33(9): 666-672.
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Abstract The effect of surfactant polyethylene glycol (PEG) 6000 on the electroless copper plating process in a bath of dual-ligands ethylenediamine tetraacetic acid (EDTA)/tetrahydroxypropyl ethylenediamine (THPED) was investigated by electrochemical method. Mixed potential-time curves indicate that the overall process can be divided into three districts: induction, transitional and stable region. PEG6000 can slowdown the negative shifting of electrode potential, which related to the retardation of the adsorption of charged ions resulted from the surfactant adsorption on the copper electrode. Linear sweep voltammetry measurements show that cathodic reduction reaction is the controlling step for the plating process; PEG6000 could retard cathodic polarization, therewith, the peak value of cathodic reduction current decreased about 40%, so PEG6000 linearly reduced deposit speed. The copper layers prepared from the bath with PEG6000 are product of high-purity with a surface morphology of uniformly distributed fine particles, moreover, the addition of PEG6000 favored the formation of copper layer with (220) preferred orientation with refined grains of average size 50.0 nm, in comparison with 77.7 nm that from the bath without PEG6000 addition.
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Received: 14 January 2019
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Fund: the Changzhou Science and Technology Program(CJ20180014) |
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