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| Microstructure and Properties of (Ti, Al, Zr)N Multi–components Hard Reactive Films with N–gradient Distributions |
| L¨U Huimin1, ZHANG Jun 1,2 |
1.College of Mechanical Engineering, Shenyang University, Shenyan 110044
2. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams Ministry of Education, Dalian University of Technology, Dalian 116042 |
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Cite this article:
LU Huimin ZHANG Jun. Microstructure and Properties of (Ti, Al, Zr)N Multi–components Hard Reactive Films with N–gradient Distributions. Chin J Mater Res, 2011, 25(1): 89-94.
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Abstract (Ti, Al, Zr)N multi–component hard films with N–gradient distributions were prepared by multi arc ion plating (MAIP) technology using the combined pure Zr and Ti–Al alloy targets. The surface and cross–fracture morphology, the surface compositions and the phase structure of the as–deposited films were observed and measured. The effects of bias voltage on the film quality, phase structure, the micro–hardness, the adhesion between film and substrate and the thermal shock resistance were investigated. In comparison with TiN, (Ti, Al)N and (Ti, Zr)N films, the as–deposited (Ti,Al,Zr)N films from the combination of pure Zr and Ti–Al alloy targets exhibited higher micro–hardness values even up to HV6000. Each of the as–deposited films has very high adhesion strength, in terms of critical load, larger than 180 N. The good heat shock resistance was also reached for each of the as–deposited films.
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Received: 21 September 2010
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| Fund: Supported by the Program for Liaoning Excellent Talents in University No.RC–05–05. |
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