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| Structure and properties of ta-C films deposited by filtered cathodic vacuum arc technology as a function of substrate bias |
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| 哈尔滨工业大学 |
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Cite this article:
;. Structure and properties of ta-C films deposited by filtered cathodic vacuum arc technology as a function of substrate bias. Chin J Mater Res, 2004, 18(1): 76-76.
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Abstract Tetrahedral amorphous carbon (ta-C) films have been deposited on P-type <100> polished c-silicon wafer with different substrate negative bias by filtered cathodic vacuum arc technology. The microstructure of ta-C films were measured by visible Raman spectroscopy and the spectra were fitted with a single skewed Lorentzian peak described by BWF function. The coupling coefficient characterizes the asymmetric degree of the spectra and is correlated with the sp3 content. The surface morphology and mechanical properties were researched respectively by AFM and Nano-Indentor. When the substrate bias is -80 V, the sp3 content is most, the root mean square surface roughness is least (Rq=0.23 nm) and hardness (51.49 GPa), Young's modulus (512.39 GPa), and critical scratching load (11.72 mN) are highest. As the substrate bias increases or decreases, the sp3 content and other properties lower correspondingly.
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Received: 10 March 2003
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