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| Low-temperature Deposition of α-(Al,Cr)2O3 Films by Reactive Sputtering Method |
Wanqi QIU1( ), Shulin WANG1, Yitian CHENG1, Zhongwu LIU1, Xichun ZHONG1, Dongling JIAO1, Kesong ZHOU1,2 |
1 College of Materials Science and Engineering, South China University of Technology, Guangzhou 510640, China
2 Guangdong Research Institute of New Materials, Guangdong Academy of Sciences, Guangzhou 510650, China |
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Cite this article:
Wanqi QIU, Shulin WANG, Yitian CHENG, Zhongwu LIU, Xichun ZHONG, Dongling JIAO, Kesong ZHOU. Low-temperature Deposition of α-(Al,Cr)2O3 Films by Reactive Sputtering Method. Chinese Journal of Materials Research, 2018, 32(4): 278-282.
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Abstract The corundum structure oxide films were successfully deposited by HPPMS (High Power Pulsed Magnetron Sputtering) method by reactive sputtering Al- and AlCr alloy-target respectively at low-temperature. The surface morphology, phase constituent, chemical composition and mechanical property of the as-deposited films were analyzed by SEM (Scanning Electron Microscopy), GIXRD (Grazing Incidence X-ray Diffraction), EDS (Energy Dispersive Spectroscopy) and Hysitron TI 950 nanoindentation, respectively. Results show that Al2O3 films deposited by sputtering Al target contain a large number of droplet-particles caused by micro-arcing on the target-surface during reactive sputtering process. The droplet-particles not only increase the surface roughness but micro-porosity in the film as well, which then greatly decreases the film hardness. The micro-arcing can be effectively eliminated by using Al-50% Cr alloy target. The stable sputtering process ensures the deposition of smooth and compact films, thereby increases the film hardness greatly. The corundum phase films of α-(Al,Cr)2O3 could be fabricated at 540℃ and 10% O2 partial pressure.
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Received: 03 July 2017
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| Fund: Supported by National Natural Science Foundation of China (No. 51271079), Natural Science Foundation of Guangdong Province (No. 2015A030313223) |
| [1] | Zhang M, Xu B, Ling G.Preparation and characterization of α-Al2O3 film by low temperature thermal oxidation of Al8Cr5 coating[J]. Appl. Surf. Sci., 2015, 331(1): 1 | | [2] | Edlmayr V, Moser M, Walter C, et al.Thermal stability of sputtered Al2O3 coatings[J]. Surf. Coat. Technol., 2010, 204: 1576 | | [3] | Levin I, Brandon D.ChemInform Abstract: Metastable Alumina Polymorphs: Crystal Structures and Transition Sequences[J]. J. Am. Ceram. Soc., 1998, 29(43): 1995 | | [4] | Ruppi S.Deposition, microstructure and properties of texture-controlled CVD α-Al2O3 coatings[J]. Int. J. Refract. Met. Hard Mater., 2005, 23(4): 306 | | [5] | Mao X H, Liu Y F, Zhang H K, et al.Investigation of hysteresis loops of alumina films deposited by pulsed reactive sputtering aluminum targets[J]. Vac. Sci. Technol., 2000, 20(2): 88(茅昕辉,李云峰,张浩康等. 铝靶脉冲反应溅射沉积氧化铝薄膜中的迟滞回线的研究[J]. 真空科学与技术学报, 2000, 20(2): 88) | | [6] | Wallin E, Andersson J M, Lattemann M, et al.Influence of residual water on magnetron sputter deposited crystalline Al2O3 thin films[J]. Thin Solid Films, 2008, 516(12): 3877 | | [7] | Zywitzki O, Hoetzsch G. Influence of coating parameters on the structure and properties of Al2O3 layers reactively deposited by means of pulsed magnetron sputtering [J]. Surf. Coat. Technol., 1996, s86-87(86): 640 | | [8] | Sproul W D, Christie D J, Carter D C.Control of reactive sputtering processes[J]. Thin Solid Films, 2005, 491(1-2): 1 | | [9] | Wallin E, Selinder T I, Elfwing M, et al.Synthesis of α-Al2O3 thin films using reactive high-power impulse magnetron sputtering[J]. EPL(Europhysics Letters), 2008, 82: 36002 | | [10] | Jin P, Xu G, Tazawa M, et al.Low temperature deposition of α- Al2O3 thin films by sputtering using α-Cr2O3 template[J]. J. Vac. Sci. Technol. A. Vac. Surf. Films, 2002, 20(6): 2134 | | [11] | Andersson J M, Czigány Z, Jin P, et al.Microstructure of α-alumina thin films deposited at low temperatures on chromia template layers[J]. J. Vac. Sci. Technol. A. Vac. Surf. Films, 2004, 22(1): 117 | | [12] | Eklund P, Sridharan M, Sillassen M, et al.α-Cr2O3 template-texture effect on α-Al2O3 thin-film growth[J]. Thin Solid Films, 2008, 516(21): 7447 | | [13] | Hairsworth S V, Page T F.Nanoindentation studies of the chemomechanical effect in sapphire[J]. J. Mater. Sci., 1994, 29(21): 5529 | | [14] | He D, Li S, Liu X P, et al.Influence of annealing treatment on composition, crystal shape and microstructure of MOCVD alumina films[J]. Rare Metals, 2012, 36(5): 762(何笛,李帅,刘晓鹏等. 退火处理对MOCVD氧化铝薄膜成分、晶型及微观结构的影响[J]. 稀有金属, 2012(5): 762) | | [15] | Lin J, Sproul W D.Structure and properties of Cr2O3 coatings deposited using DCMS, PDCMS, and DOMS[J]. Surf. Coat. Technol., 2015, 276: 70 | | [16] | Mchale J M, Auroux A, Perrotta A J, et al.Surface Energies and Thermodynamic Phase Stability in Nanocrystalline Aluminas[J]. Science, 1997, 277(5327): 788 | | [17] | Shang K, Zhao Z Y, Hou H L.Hysteretic deformation test and finite element analysis of DP600 bending deformation[J]. J. Net. Form. Eng., 2014, 6(5): 59(尚可, 赵志勇, 候红亮. DP600弯曲变形滞后回弹试验及有限元探究[J]. 精密成型工程, 2014, 6(5): 59) | | [18] | Oliver W C, Pharr G M J. An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation[J]. J. Mater. Res., 1992, 7: 1564 | | [19] | Holleck H.Material selection for hard coatings[J]. J. Vac. Sci. Technol. A. Vac. Surf. Films, 1986, 4(6): 2661 |
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