|
|
|
| 原子层淀积Al2O3薄膜表面自组装Au纳米颗粒及其热稳定性 |
| 黄玥;廖忠伟;苟鸿雁;丁士进; 张卫 |
| 复旦大学专用集成电路与系统国家重点实验室 上海 200433 |
|
| Investigation of self-assembly growth and thermal stability of Au nano-particles on atomic-layer-deposited Al2O3 film |
| HUANG Yue;LIAO Zhongwei;GOU Hongyan;DING Shijin;ZHANG Wei |
| State Key Lab of ASIC & System; Fudan University; Shanghai 200433 |
引用本文:
黄玥 廖忠伟 苟鸿雁 丁士进 张卫. 原子层淀积Al2O3薄膜表面自组装Au纳米颗粒及其热稳定性[J]. 材料研究学报, 2009, 23(1): 13-16.
,
,
,
,
,
.
Investigation of self-assembly growth and thermal stability of Au nano-particles on atomic-layer-deposited Al2O3 film[J]. Chin J Mater Res, 2009, 23(1): 13-16.
| 1 A.Thean, J.P.Leburton, Flash memory: towards singleelectronics, IEEE Potentials, 21(Oct/Nov), 35(2002)
2 Z.Liu, C.Lee, V.Narayanan, G.Pei, E.C.Kan, Metal nanocrystal memories : Device design and fabrication,
IEEE Trans. Electron Devices, 49(9), 1606(2002)
3 D.U.Lee, M.S.Lee, J.H.Kim, Floating gated silicon-oninsulator nonvolatile memory devices with Au anoparticles embedded in SiO1.3N insulators by digital sputtering method, Appl. Phys. Lett., 90(9), 093514(2007)
4 J.H.Kim, K.H.Baek, C.K.Kim, Y.B.Kim, C.S.Yoon, Formation of gold nanoparticles embedded in a polyimide film
for nanofloating gate memory, Appl. Phys. Lett., 90(12), 123118(2007)
5 C.C.Wang, Y.K.Chiou, C.H.Chang, Memory characteristics of Au nanocrystals embedded in metal-oxidesemiconductor structure by using atomic-layer-deposited Al2O3 as control oxide, J. of Phys. D, 40(6), 1673(2007)
6 W.L.Leong, P.S.Lee, S.G.Mhaisalkar, Charging phenomena in pentacene-gold nanoparticle memory device, Appl. Phys. Lett., 90(4), 042906(2007)
7 R.J.Tseng, J.X.Huang, J.Y.Ouyang, R.B.Kaner, Y.Yang, Polyaniline nanofiber/gold nanoparticle nonvolatile memory, Nano Letters, 5(6), 1077(2005)
8 W.H.Guan, S.B.Long, Fabrication and charging characteristics of MOS capacitor structure with metal nanocrystals embedded in gate oxide, J. Phys. D, 40(9), 2754(2007)
9 C.Lee, J.Meteer, V.Narayanan, E.C.Kan, Self-assembly of metal nanocrystals on ultrathin oxide for nonvolatile memory applications, J. Electronic Materials, 34(1), 1(2005)
10 J.Y.Yang, J.H.Kim, W.J.Choi, Y.H.Do, C.O.Kim, J.P.Hong, Enhanced electrical characteristics of Au
nanoparticles embedded in high-k HfO2 matrix, J. Appl. Phys., 100(8), 066102(2006)
11 M.Zhang, W.Chen, S.J.Ding, Z.Y.Liu, Y.Huang, Z.W.Liao, D.W.Zhang, Physical and electrical characterization
of atomic-layer-deposited Ru nanocrystals embedded into Al2O3 for memory applications, J. Phys. D, 41(3), 032007(2007)
12 S.J.Huo, Q.X.Li, Y.G.Yan, Y.Chen, W.B.Cai, Q.J.Xu, M.Osawa, Turnable surface-enhanced infrared absorption
on Au nanofilms on si fabricated by self-assembly and growth of colloidal particles, J. Phy. Chem. B, 109,
15985(2005)
13 M.Xu, H.L.Lu, S.J.Ding, Effect of trimethyl aluminium surface pretreatment on atomic layer deposition Al2O3
ultra-thin film on Si substrate, Chin. Phys. Lett., 22(9), 2418(2005)
14 J.Hu, W.Li, J.Chen, Novel plating solution for electroless deposition of gold film onto glass surface, Surface and Coatings Technology, 202(13), 2922(2008)
15 O.Renault, L.G.Gosset, D.Rouchon, A.Ermolieff, Angleresolved X-ray photoelectron spectroscopy of ultrathin
Al2O3 films grown by atomic layer deposition, J. Vac. Sci. Technol. A, 20(6), 1867(2002)
16 D.T.Zhao, Y.Zhu, J.L.Liu, Charge storage in a metal-oxide-semiconductor capacitor containing cobalt
nanocrystals, Solid-State Electronics, 50(2), 268(2006)
17 P.Sangpour, O.Akhavan, A.Z.Moshfegh, M.Roozbehi, Formation of gold nanoparticles in heat-treated reactive
co-sputtered Au-SiO2 thin films, Applied Surface Science, 254(1), 286(2007)
18 A.F.Wang, H.Y.Tang, T.Cao, In vitro stability study of organosilane self-assemble monolayers and multilayers,
Journal of Colloid and Interface Science, 291(2), 438(2005) |
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
| |
Shared |
|
|
|
|
| |
Discussed |
|
|
|
|
