磁控溅射铜膜与基底结合强度的分析研究*

doi:10.11901/1005.3093.2015.619

材料研究学报

2016, Vol. 30

Issue (8): 634-640 DOI: 10.11901/1005.3093.2015.619

本期目录 | 过刊浏览

磁控溅射铜膜与基底结合强度的分析研究*

李佳君¹, 刘浩¹, 左永刚¹, 白旸¹, 袁禾蔚¹, 何其宇², 姜龙², 郭辉², 孙振路², 陈广超¹

1. 中国科学院大学材料科学与光电技术学院北京 100049
2. 河北省科学院激光所石家庄 050081

Analysis of Adhesive Strength between Magnetron Sputtered Copper Films and Substrate

LI Jiajun¹, LIU Hao¹, ZUO Yonggang¹, BAI Yang¹, YUAN Hewei¹, HE Qiyu², JIANG Long², GUO Hui², SUN Zhenlu², CHEN Guangchao^1,^**

1. College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
2. Hebei Institute of Laser, Shijiazhuang 050081, China

引用本文:

李佳君, 刘浩, 左永刚, 白旸, 袁禾蔚, 何其宇, 姜龙, 郭辉, 孙振路, 陈广超. 磁控溅射铜膜与基底结合强度的分析研究*[J]. 材料研究学报, 2016, 30(8): 634-640.
Jiajun LI, Hao LIU, Yonggang ZUO, Yang BAI, Hewei YUAN, Qiyu HE, Long JIANG, Hui GUO, Zhenlu SUN, Guangchao CHEN. Analysis of Adhesive Strength between Magnetron Sputtered Copper Films and Substrate[J]. Chinese Journal of Materials Research, 2016, 30(8): 634-640.

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摘要:

根据磁控溅射金属铜膜在超声清洗中从硅基底上发生剥落的现象, 分析了样品在声场中的运动和受力状态, 发现样品会发生受迫振动, 拉-拉周期应力引起膜基界面的失效是薄膜脱落的主要原因, 而空化作用是次要原因。通过建立的力学模型, 计算了膜基结合强度。与划痕法等所测得的膜基结合强度值的比较, 计算值与测量值在数量级和与溅射参数变化趋势上有很好的吻合。此评价方法可以应用于溅射铜膜/多晶金刚石的膜基体系上, 并研究了超声参数、基底表面形貌、基底成份等因素对膜基结合强度的影响。

关键词 ：材料检测与分析技术, 膜基结合强度, 超声清洗, 受迫振动, 磁控溅射, 铜薄膜

Abstract：

As magnetron sputtering copper films would flake from silicon substrates in the ultrasonic cleaner, this paper analyzed the states of motion and stress of samples in the ultrasonic medium. By calculation, it was found that the tension-tension cycle stress caused by forced vibration was the main reason of interface damage. Then the ultrasonic mechanical model was established and the film-substrate adhesive strength was calculated. The results showed that the adhesive strength values gotten by the ultrasonic test method were in the same order of magnitude compared with that of scratch test results. In addition, this ultrasonic test method was used to test adhesion of copper films on diamond substrates. The influence of ultrasonic parameters, substrate morphology as well as composition on adhesive strength was also discussed.

Key words： materials testing and analysis adhesive strength ultrasonic cleaning forced vibration magnetron sputtering copper film

收稿日期: 2015-11-02

基金资助:* 国家自然基金50128790, 中科院百人计划, 科学院装备计划项目yz201356, 北京市科技计划课题Z151100003315024, 河北省科技计划项目14291110D资助

作者简介: 本文联系人: 陈广超, 教授

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	李佳君
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	白旸
	袁禾蔚
	何其宇
	姜龙
	郭辉
	孙振路
	陈广超
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https://www.cjmr.org/CN/10.11901/1005.3093.2015.619 或 https://www.cjmr.org/CN/Y2016/V30/I8/634

表1 溅射参数及对应样品

图1 Si-1样品超声处理前后的表面铜膜形貌: (a)超声处理前; (b)超声处理1 min; (c)超声处理2 min。

图2 溅射功率与铜膜失效时间和剥落速度的关系

图3 (a)Si-1样品(b)Si-2样品(c)Si-3样品的纳米划痕结果

图4 (a)超声模拟模型。假定振荡源处声压幅值为1时(b)距离底面15 mm的水平面内, 距离中轴线0 mm, 30 mm, 60 mm处接收到的声压幅值(c)中轴线上距离底面5 mm, 10 mm, 15 mm, 20 mm处接收到的声压幅值

图5 分别使用超声方法与划痕法得到的膜基结合强度

图6 不同金刚石基底的表面形貌(a)抛光样品(b)细晶样品(c)粗晶样品

图7 金刚石基底的(a)XRD结果和(b)拉曼结果

图8 超声处理60 min后各样品的外观(其中的弧形区域为夹具形状): (a)抛光样品(b)细晶样品(c)粗晶样品

表2 铜膜在金刚石基底上的失效时间和超声法获得的膜基结合强度

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