氮流量比对磁控溅射(CoCrFeNi)N<i><sub>x</sub></i>高熵合金薄膜的组织和性能的影响

doi:10.11901/1005.3093.2018.374

材料研究学报

2019, Vol. 33

Issue (3): 185-190 DOI: 10.11901/1005.3093.2018.374

本期目录 | 过刊浏览

氮流量比对磁控溅射(CoCrFeNi)N_x高熵合金薄膜的组织和性能的影响

刘晓东¹,谈淑咏²,霍文燚¹,张旭海¹,邵起越¹,方峰¹(

)

1. 东南大学江苏省先进金属材料高技术研究重点实验室南京 211189
2. 南京工程学院材料工程学院南京 211167

Effect of Nitrogen Flow Ratio on Microstructure and Property of High-Entropy Alloy Films (CoCrFeNi)N_x Prepared by Magnetron Sputtering

Xiaodong LIU¹,Shuyong TAN²,Wenyi HUO¹,Xuhai ZHANG¹,Qiyue SHAO¹,Feng FANG¹(

)

1. Jiangsu Key Laboratory of Advanced Metallic Materials, Southeast University, Nanjing, 211189, China
2. School of Materials Science and Engineering, Nanjing Institute of Technology, Nanjing 211167, China

引用本文:

刘晓东,谈淑咏,霍文燚,张旭海,邵起越,方峰. 氮流量比对磁控溅射(CoCrFeNi)N_x高熵合金薄膜的组织和性能的影响[J]. 材料研究学报, 2019, 33(3): 185-190.
Xiaodong LIU, Shuyong TAN, Wenyi HUO, Xuhai ZHANG, Qiyue SHAO, Feng FANG. Effect of Nitrogen Flow Ratio on Microstructure and Property of High-Entropy Alloy Films (CoCrFeNi)N_x Prepared by Magnetron Sputtering[J]. Chinese Journal of Materials Research, 2019, 33(3): 185-190.

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摘要:

采用直流磁控溅射法制备(CoCrFeNi)N_x高熵薄膜，研究了氮流量比对薄膜的力学性能和电磁性能的影响。结果表明，在不同氮流量比条件下制备的(CoCrFeNi)N_x薄膜，都具有致密的组织、简单的FCC结构并呈现(200)择优取向。随着氮流量比从10%提高到30%，薄膜的硬度和弹性模量随之增大，其最大值达到14 GPa和212 GPa；电阻率基本上呈增大的趋势，最大值达到138 μΩ?cm；饱和磁化强度和磁导率随之减小，薄膜饱和磁化强度最高为427.43 emu/cm³。薄膜的矫顽力约为0。

关键词 ：磁控溅射, (CoCrFeNi)N_x, 材料表面与界面, 硬度, 电阻率, 磁性能

Abstract：

High-entropy alloy films of (CoCrFeNi)N_x were prepared by direct current magnetron sputtering. The effect of nitrogen flow ratio on the microstructure, mechanical-, electrical- and magnetic- properties of the films were investigated. The results show that all dense (CoCrFeNi)N_x films prepared with different nitrogen flow ratio all consist of simple single face-centered cubic phase with (200) preferred orientation. With the increase of nitrogen flow ratio from 0 to 30%, both the hardness and elasticity modulus increase. The max values of the hardness and elasticity modulus are 14 GPa and 212 GPa, respectively. The resistivity of (CoCrFeNi)N_x films increases with the increasing nitrogen flow ratio, while the saturation magnetization and permeability decrease. The max value of the resistivity is 138 μΩ?cm, the highest saturation magnetization is 427.43 emu/cm³, and the coercivity remains around 0.

Key words： surface and interface in the materials magnetron sputtering (CoCrFeNi)N_x hardness resistivity magnetic properties

收稿日期: 2018-06-06

ZTFLH:

TB43

基金资助:国家自然科学基金项目(51371050);江苏省产学研前瞻性研究项目(BY2016076-08);江苏省六大人才高峰项目(2015-XCL-004);张家港市重点研发项目(ZKG1614);江苏省先进结构材料与应用技术重点实验室开放基金(ASMA201708)

作者简介: 刘晓东，女，1994年生，硕士生

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表1 氮流量比不同的薄膜的成分

图1 氮流量比不同的(CoCrFeNi)Nx高熵合金薄膜的XRD衍射谱

图2 氮流量比不同的(CoCrFeNi)Nx薄膜的晶格参数和晶粒尺寸

图3 氮流量比不同的(CoCrFeNi)Nx薄膜的表面形貌

图4 氮流量比不同的(CoCrFeNi)Nx薄膜的AFM形貌图

图5 氮流量比不同的(CoCrFeNi)Nx薄膜的截面形貌

图6 (CoCrFeNi)Nx薄膜沉积速率与氮流量比的关系

图7 (CoCrFeNi)Nx薄膜硬度和弹性模量与氮流量比的关系

图8 (CoCrFeNi)Nx薄膜电阻率与氮流量比的关系

图9 (CoCrFeNi)Nx薄膜的磁性与氮流量比的关系

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