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光谱法控制ITO膜沉积速率 |
黄士勇;王德苗;任高潮;陈抗生 |
浙江大学;浙江大学;浙江大学;浙江大学 |
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CONTROLLING DEPOSITION RATE OF ITO FILM BY SPECTROMETRY |
HUANG Shiyong; WANG Demiao; REN Gaocao; CHEN Kangsheng (Zhejiang University) |
引用本文:
黄士勇;王德苗;任高潮;陈抗生. 光谱法控制ITO膜沉积速率[J]. 材料研究学报, 1997, 11(3): 328-330.
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CONTROLLING DEPOSITION RATE OF ITO FILM BY SPECTROMETRY[J]. Chin J Mater Res, 1997, 11(3): 328-330.
1.Hamberg and C.G.Granqvist,J.Appl.Phys. 60,123(1986) 2.H.L.Ma, D.H.Zang,Thin Solid Film. 263, 105(1995) 3.S.Ray, R.Banerjee, J.Appl.Phys. 54, 3497(1983) 4.蒋静坪.计算机实时控制系统(杭州,浙江大学出版社,1992) |
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