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分离送入甲烷和氢气的热丝法沉积金刚石膜 |
陈广超;黄荣芳;闻立时 |
中国科学院金属研究所;中国科学院金属研究所;中国科学院金属研究所 |
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DEPOSITION DIAMOND FILM BY HFCVD WITH SEPARATE INLET OF CH_4 AND H_2 |
CHEN Guangchao; HUANG Rongfang; WEN Lishi (Institute of Metal Research;Chinese Academy of Sciences) |
引用本文:
陈广超;黄荣芳;闻立时. 分离送入甲烷和氢气的热丝法沉积金刚石膜[J]. 材料研究学报, 1997, 11(3): 331-333.
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DEPOSITION DIAMOND FILM BY HFCVD WITH SEPARATE INLET OF CH_4 AND H_2[J]. Chin J Mater Res, 1997, 11(3): 331-333.
1.M.Sommcr,F.W.Smith,1.Mater.Res.5(11),2433(1990) 2.C.J.Chu, M.P.D’Evelyn, R.H.Hauge,J.L.Margravc,J.Mater.Res. 5(11),2405(1990) 3.C.J.Chu, M.P.D’Evelvn, R.H.Hause,J.L.Marsrave,J.Appl.Phys. 70(3),1695(1991) 4.K.Tankala,T.Debroy,J.Appl.Phys.72(2),712(1992) |
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