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Chinese Journal of Materials Research  2014, Vol. 28 Issue (9): 703-709    DOI: 10.11901/1005.3093.2013.131
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Electrochemical Deposition and Corrosion Resistance of Mg(OH)2 Films on Magnesium Alloy
Fengxia WU1,2,3,Weixue LI1,2,**(),Jun LIANG3
1. State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou University of Technology, Lanzhou 730050
2. School of Science, Lanzhou University of Technology, Lanzhou 730050
3. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000
Cite this article: 

Fengxia WU,Weixue LI,Jun LIANG. Electrochemical Deposition and Corrosion Resistance of Mg(OH)2 Films on Magnesium Alloy. Chinese Journal of Materials Research, 2014, 28(9): 703-709.

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Abstract  

Mg(OH)2 films were electrodeposited on the surface of AZ91D magnesium alloys in Mg(NO3)2 solutions at room temperature using cathodic potentiostatic and potentiostatic-pulse methods respectively. The characteristics of the Mg(OH)2 films were investigated by scanning electronic microscope (SEM) and X-ray diffraction (XRD). The corrosion resistance of the films was evaluated using potentiodynamic polarization tests. The results show that the Mg(OH)2 films are uniform and compact without obvious defects. Mg(OH)2 films enhanced the corrosion resistance of the AZ91D alloy. The Mg(OH)2 film deposited by potentiostatic pulse method was superior to that deposited by potentiostatic method in terms of uniformity and compactness and corrosion resistance.
Key words:  materials failure and protection      Mg(OH)2 films      electrochemical deposition      potentiostatic pulse      corrosion resistance     
Received:  24 March 2014     
Fund: *Supported by the Natural Science Foundation of Gansu Province No.1010RJZA045, the Doctor Foundation of Lanzhou University of Technology and the “Hundred Talents Program” of Chinese Academy of Sciences (J. Liang).
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Fengxia WU
Weixue LI
Jun LIANG

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https://www.cjmr.org/EN/10.11901/1005.3093.2013.131     OR     https://www.cjmr.org/EN/Y2014/V28/I9/703

Al Mn Zn Fe Si Ni Cu Mg
9.1 0.27 0.85 0.005 0.01 0.002 0.02 Remainder
Table 1  Chemical composition of AZ91D magnesium alloy (mass fraction, %)
Fig.1  Variation of current density of potentiostatic deposition and potentiostatic pulse deposition with deposition time (a), Fig.1b is the high magnification of Fig.1a (a. potentiostatic deposition, b. potentiostatic pulse deposition)
Fig.2  XRD patterns of the films using potentiostatic deposition (a) and potentiostatic pulse deposition (b)
Fig.3  DC and macroscopic images of Mg(OH)2 films using potentiostatic deposition (a) and potentiostatic pulse deposition (b)
Fig.4  SEM images of the Mg(OH)2 films using potentiostatic deposition (a, b) and potentiostatic pulse deposition (c, d)
Fig.5  Cross-sectional morphologies of Mg(OH)2 films using potentiostatic deposition (a) and potentiostatic pulse deposition (b)
Fig.6  Polarization curves of uncoated AZ91D alloy (a), the Mg(OH)2 films using cathode potentiostatic deposition (b) and using potentiostatic pulse deposition (c) in 3.5% NaCl solution
Ecorr vs. Ag/AgCl/V Icorr /Acm?2
Uncoated AZ91D alloy ?1.39 4.23×10-5
Coated Mg(OH)2 films (potentiostatic deposition) ?1.34 5.36×10-6
Coated Mg(OH)2 films (potentiostatic pulse deposition) -1.26 7.49×10-7
Table 2  Corrosion potentials and current densities derived from the electrochemical measurements of the samples
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