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| Fabrication and Surface Properties of ZrN Films by High Power Pulsed Magnetron Sputtering |
| WU Zhongzhen, TIAN Xiubo, DUAN Weizan, GONG Chunzhi, YANG Shiqin |
| State Key Lab of Advanced Welding Production Technology, Harbin Institute of Technology, Harbin 150001 |
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Cite this article:
WU Zhongzhen TIAN Xiubo DUAN Weizan GONG Chunzhi YANG Shiqin. Fabrication and Surface Properties of ZrN Films by High Power Pulsed Magnetron Sputtering. Chin J Mater Res, 2010, 24(6): 561-566.
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Abstract ZrN nano-films were prepared by high power pulsed magnetron sputtering technique (HPPMS) under the different work pressures. SEM and XRD were used to investigate the surface morphologies and the phase structure of the films. The results show that the surface of the prepared ZrN films was smooth and dense, and they have no any macroparticles. The grains of the films grow under the preferred orientations of ZrN (111) and ZrN (220), and show the combined texture with several preferred orientations. The films have very high hardness of 33.1GPa and lower friction coefficient of 0.2. Corrosion resistance has been improved with an increase of the corrosion potential by 0.28V and a decrease of corrosion current by a factor of 5. The samples fabricated at low work pressure possess a better surface properties, but the surface hardness, wear-resistance and corrosion resistance show a decrease at high gas pressure due to more frequent particle collisions.
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Received: 10 August 2010
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| Fund: Supported by National Natural Science Foundation of China Nos.10775036 and 50773015 and Program for New Century Excellent Talents in University of China. |
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