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| Pore Structural Analysis on Poly(Methyl)silsesquioxane Porous Thin Films by Synchrotron Radiation Small Angle X–ray Scattering |
| GAO Fangliang1, LI Shengying1, CHEN Hongji1, WU Zhonghua2, LI Zhihong2 |
1.Department of Material Science & Engineering, Jinan University, Guangzhou 510632
2.Beijing Synchrotron Radiation Laboratory, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049 |
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Cite this article:
GAO Fangliang LI Shengying CHEN Hongji WU Zhonghua LI Zhihong. Pore Structural Analysis on Poly(Methyl)silsesquioxane Porous Thin Films by Synchrotron Radiation Small Angle X–ray Scattering. Chin J Mater Res, 2012, 26(1): 68-72.
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Abstract A group of poly(methyl)silsesquioxane nanoporous thin films were prepared by pore–generating and spin–coating processes. The nanoporous thin films were characterized using Fourier transform infrared spectroscopy (FT–IR) and thermogravimetric analyzer (TGA). And their scattering profiles and scattering intensities of the group of samples with different porosity were obtained by small angle X–ray scattering (SAXS) in grazing incidence (GISAXS) mode. The results show that there is a good compatibility between the poly(methyl)silsesquioxane precursor and porogen. The films exhibit pore fractal characteristics with disagreement with Porod’s law and give out positive deviation, and the micro–density fluctuations between film substrate and pore structure existed in the system, having a maximum 3 nm of pore radius for the group of poly(methyl)silsesquioxane nanoporous thin films.
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Received: 10 January 2011
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