A novel means for preparing nano-microcrystalline NiOx films by magnetron sputtering

Chin J Mater Res

2009, Vol. 23

Issue (4): 426-430 DOI:

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A novel means for preparing nano-microcrystalline NiO_x films by magnetron sputtering

WANG Huaiyi^1;2; DIAO Xungang ¹; WANG Wuyu ³; HAO Weichang ¹; WANG Cong ¹; WANG Tianmin ¹

1.School of Science; Beihang University; 100083 Beijing
2.Science Education Department; Beijing Institute of Graphic Communication; 102600 Beijing
3.General Research Institute for Non-ferrous Metals; 100088 Beijing

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Huai-yi WANG Xungang DIAO Wuyu WANG Weichang HAO Cong WANG. A novel means for preparing nano-microcrystalline NiO_x films by magnetron sputtering. Chin J Mater Res, 2009, 23(4): 426-430.

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Abstract

NiOx electrochromic films with small grain size (<22 nm) have been prepared by using a liquid-nitrogen-cooled apparatus with a magnetron sputtering installation being equipped. When identical deposition parameters have been employed, relying on liquid nitrogen cooling substrates, the grain sizes of films can be controlled and reduced. The results showed that the electrochromic performance and the O/Ni rate of NiOx film prepared with cooling substrate were superior to that of NiOx film deposited without cooling substrate.

Key words: inorganic non-metallic materials magnetron sputtering nano-microcrystalline state electrochromism NiOx film

Received: 06 October 2008

ZTFLH:

O484

Fund:

Supported by National Key Basic Research and Development Program of China No.2007CB936300.

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https://www.cjmr.org/EN/ OR https://www.cjmr.org/EN/Y2009/V23/I4/426

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