DEPOSITION OF TiN ON INSULATOR ALUNDUM BY DC-PCVD INSTRUMENT

Chin J Mater Res

1992, Vol. 6

Issue (1): 60-63 DOI:

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DEPOSITION OF TiN ON INSULATOR ALUNDUM BY DC-PCVD INSTRUMENT

YANG Chuan;WU Daxing;GAO Guoqing(Southwest Jiaotong University)

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YANG Chuan;WU Daxing;GAO Guoqing(Southwest Jiaotong University). DEPOSITION OF TiN ON INSULATOR ALUNDUM BY DC-PCVD INSTRUMENT. Chin J Mater Res, 1992, 6(1): 60-63.

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Abstract The thin film TiN that has been deposited on the insulation alundum by DCplasma chemical deposition(DC-PCVD)instrument has a strong adhesion to the substrate.The forming mechanism of thin film TiN and effect factor of the film quality have been dis-cussed

Key words: DC-PCVD alundum deposition

Received: 25 February 1992

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1 李恒德,肖继美.材料表面与界面,北京:清华大学出版社,1990:77
2 王福贞,闻立时.表面沉积技术,北京:机械工业出版社,1989:10

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