A honeycomblike porous film has been fabricated from a homogeneous solution of tadpole POSS acrylate block copolymer (POSS-PMMA-b-PS), which was made via atom transfer radial polymerization (ATRP) polymerization in one pot, using the static breath figures method. Taking into account of the formation mechanism of the pore, the influencing factors, such as the kind of solvent, the concentration of the solution and relative humidity for the formation of self-assembled block copolymer membrane, have been evaluated, and especially, the effects of interfaces, including air/glass wafer, air/water and air/ice interfaces, were investigated. The results show that cycloidal bubble arrays can be prepared when chloroform was chosen as solvent, concentration of POSS-PMMA-b-PS was 20 mgmL^-1, relative humidity was 80%, and the solution was cast on the air/glass wafer interface; well-patterned membrane can also be prepared when the solution was cast on air/water and air/ice interfaces in the same condition; nevertheless, the pore size and hole spacing of the latter was much smaller. The result of static contact angle with water analysis shows that this porous film has good hydrophobic performance, and the contact angle increases with the decrease of pore size; the porous film shows excellent resistance to acid, alkaline and heat.