弧流对超薄四面体非晶碳膜的结构和性能的影响*

doi:10.11901/1005.3093.2016.104

材料研究学报

2016, Vol. 30

Issue (11): 875-880 DOI: 10.11901/1005.3093.2016.104

论文

本期目录 | 过刊浏览

弧流对超薄四面体非晶碳膜的结构和性能的影响*

许世鹏^1,³,陈维铅^1,³,李玉宏^1,³,李晓伟²(

)

1. 甘肃省太阳能发电系统工程重点实验室酒泉职业技术学院酒泉 735000
2. 中国科学院海洋新材料与应用技术重点实验室浙江省海洋材料与防护技术重点实验室中国科学院宁波材料技术与工程研究所宁波 315201
3. 酒泉新能源研究院酒泉 735000

Effect of Arc Current on Structure and Properties of Ultrathin Tetrahedral Amorphous Carbon Film

Shipeng XU^1,³,Weiqian CHEN^1,³,Yuhong LI^1,³,Xiaowei LI^2,^**(

)

1. Jiuquan Vocational and Technical College, Gansu Key Laboratory of Solar Power Generation System Project, Jiuquan 735000, China
2. Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
3. Jiuquan New Energy Research Institute, Jiuquan 735000, China

引用本文:

许世鹏, 陈维铅, 李玉宏, 李晓伟. 弧流对超薄四面体非晶碳膜的结构和性能的影响*[J]. 材料研究学报, 2016, 30(11): 875-880.
Shipeng XU, Weiqian CHEN, Yuhong LI, Xiaowei LI. Effect of Arc Current on Structure and Properties of Ultrathin Tetrahedral Amorphous Carbon Film[J]. Chinese Journal of Materials Research, 2016, 30(11): 875-880.

全文: PDF(1497 KB) HTML

摘要:

使用45°双弯曲磁过滤阴极真空电弧系统(FCVA)制备超薄四面体非晶碳膜(ta-C), 研究了弧流对薄膜结构和性能的影响。结果表明：当弧流由40 A增加到70 A时薄膜沉积速率提高, sp³的含量先增加后减小; 当弧流为60 A时薄膜sp³的含量达到最大66%, 密度也达到最大(3067 kg/m³)。残余压应力随着弧流的增加呈现先增加后减小的趋势, 当弧流为40 A时薄膜的残余应力最小(4 GPa)。在碳膜沉积过程中碳源粒子有填充基体凹坑和减少基体缺陷的作用, 使其表面非常光滑。超薄ta-C碳膜的表面粗糙度随着弧流的增加先降低后增加, 当弧流为50 A时薄膜表面粗糙度最小(0.195 nm)。

关键词 ：无机非金属材料, ta-C, 磁过滤阴极真空电弧, 弧流, 结构

Abstract：

Ultrathin tetrahedral amorphous carbon (ta-C) films were deposited by a home developed filtered cathodic vacuum arc technology. The effect of arc current on the structure and property of the prepared films was investigated. Results show that as the arc current increased from 40 A to 70 A, the deposition rate increased, the sp³fraction increased first and then decreased; when the arc current was 60 A the maximal density of 3.067 g/cm³ and sp³ fraction of 66% was obtained. The variation of residual compressive stress was similar to sp³ fraction. The minimum residual stress was found about 4 GPa for the arc current 40 A. The surface roughness as a function of arc current decreased gradually first and then increased, and when the arc current was 50 A the minimum surface roughness was 0.195 nm. The deposited ions could fill in the defects of substrate which leads to reducing the surface roughness of ultrathin ta-C films.

Key words： inorganic non-metallic materials ta-C FCVA arc current structure

收稿日期: 2016-02-26

基金资助:* 国家自然科学基金项目51371187, 甘肃省科技创新平台专项1505JTCF039, 甘肃省青年自然科学基金项目1506RJYF319和酒泉职业技术学院重点项目xyky[2015]z-2资助

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https://www.cjmr.org/CN/10.11901/1005.3093.2016.104 或 https://www.cjmr.org/CN/Y2016/V30/I11/875

图2 不同弧流薄膜的拉曼光谱和XPS C1s芯能级谱线

图3 弧流不同的超薄ta-C碳膜的反射率曲线和三层层状模型

表1 弧流不同的超薄ta-C碳膜的密度、厚度以及粗糙度

图4 弧流不同的超薄ta-C碳膜的残余压应力

图5 弧流不同的超薄ta-C碳膜的表面形貌

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