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| 脉冲偏压幅值对TiN/TiAlN多层薄膜微观结构和性能的影响 |
| 魏永强1,2, 田修波1, 巩春志1, 杨士勤1 |
1.哈尔滨工业大学现代焊接生产技术国家重点实验室 哈尔滨 150001
2.郑州航空工业管理学院机电工程学院 郑州 450015 |
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| Effect of Pulsed Bias Voltage on the Microstructures and properties of TiN/TiAlN Multilayer Coatings |
| WEI Yongqiang1,2, TIAN Xiubo1, GONG Chunzhi1, YANG Shiqin1 |
1.State Key Lab of Advanced Welding Production Technology, Harbin Institute of Technology, Harbin 150001
2.School of Mechanical Engineering, Zhengzhou Institute of Aeronautics Industry Management, Zhengzhou 450015 |
引用本文:
魏永强 田修波 巩春志 杨士勤. 脉冲偏压幅值对TiN/TiAlN多层薄膜微观结构和性能的影响[J]. 材料研究学报, 2011, 25(6): 630-636.
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Effect of Pulsed Bias Voltage on the Microstructures and properties of TiN/TiAlN Multilayer Coatings[J]. Chin J Mater Res, 2011, 25(6): 630-636.
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