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Chin J Mater Res  2009, Vol. 23 Issue (1): 13-16    DOI:
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Investigation of self-assembly growth and thermal stability of Au nano-particles on atomic-layer-deposited Al2O3 film
HUANG Yue;LIAO Zhongwei;GOU Hongyan;DING Shijin;ZHANG Wei
State Key Lab of ASIC & System; Fudan University; Shanghai 200433
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HUANG Yue LIAO Zhongwei GOU Hongyan DING Shijin ZHANG Wei. Investigation of self-assembly growth and thermal stability of Au nano-particles on atomic-layer-deposited Al2O3 film. Chin J Mater Res, 2009, 23(1): 13-16.

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Abstract  

The self-assembly growth of Au nano-particles on atomic-layer-deposited (ALD) Al2O3 thin film has been achieved. And the self-assembly process and the thermal stability have been investigated.The results show that the ALD Al2O3 film is inclined to adsorb (3-Aminopropyl)-trimethoxysilane (APTMS), which is in favor of self-assembly growth of Au nano-particles. The resulting Au nano-particles are mainly in the range of 5–8 nm with a density of nearly 4×1011cm−2. The annealing at 300   in N2 leads to an increase in the dimension of Au nano-particles, however, the good adsorption of APTMS and the chemical compositions of Au nano-particles are maintained. When the annealing temperature elevates to 450  , Au nano-particles exhibit severe agglomeration together with extreme nonuniformilty.

Key words:  metallic materials      self-assembly growth      Au nano-particles      thermal stability     
Received:  15 July 2008     
ZTFLH: 

TB383

 
Fund: 

Supported by National High Technology Research and Development Program for Advanced Materials of China No.2006AA03Z307 and the Key Project of Chinese Ministry of Education No.108052.

URL: 

https://www.cjmr.org/EN/     OR     https://www.cjmr.org/EN/Y2009/V23/I1/13

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