Effect of Axial Magnetic Field on Property of TiN/Cu Films Deposited by Arc Ion Plating

doi:10.11901/1005.3093.2017.600

Chinese Journal of Materials Research

2018, Vol. 32

Issue (5): 381-387 DOI: 10.11901/1005.3093.2017.600

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Effect of Axial Magnetic Field on Property of TiN/Cu Films Deposited by Arc Ion Plating

Shengsheng ZHAO¹(

), Yanhui ZHAO², Wei CHEN¹, Jiaxi FEI¹, Tiegang WANG³(

)

1 Shenzhen Polytechnic, Shenzhen 518055, China
2 Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
3 Tianjin University of Technology and Education, Tianjin 300222, China

Cite this article:

Shengsheng ZHAO, Yanhui ZHAO, Wei CHEN, Jiaxi FEI, Tiegang WANG. Effect of Axial Magnetic Field on Property of TiN/Cu Films Deposited by Arc Ion Plating. Chinese Journal of Materials Research, 2018, 32(5): 381-387.

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Abstract

TiN/Cu thin films were prepared on stainless steel substrate by arc ion plating with adjustable axial magnetic field. The effect of axial magnetic field intensity on the microstructure, chemical composition, mechanical properties and wear resistance of the films were investigated. Results indicated that all the TiN/Cu thin films deposited by different magnetic field intensity have the same crystallographic structure as TiN with preferential orientation (111). With the increasing magnetic field intensity, the diffraction peak intensity of (111) crystal plane significantly enhanced; the surface roughness of TiN/Cu film decreased first and then increased; the Cu content of the film increased gradually; the hardness and elastic modulus of the TiN/Cu film also increased and the wear rate first decreased then increased. When the magnetic field strength reached 80 Gs, the resulted film possessed the highest hardness about 36 GPa and the optimal wear resistance.

Key words: TiN/Cu films axial magnetic field arc ion plating hardness wear resistance

Received: 12 October 2017

Fund: Supported by National Natural Science Foundation of China (Nos. 51401128 & 51301181)

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	Shengsheng ZHAO
	Yanhui ZHAO
	Wei CHEN
	Jiaxi FEI
	Tiegang WANG

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https://www.cjmr.org/EN/10.11901/1005.3093.2017.600 OR https://www.cjmr.org/EN/Y2018/V32/I5/381

Fig.1 Schematic view of the magnetic ?eld-enhanced arc ion plating system used to deposit TiN/Cu ?lms

Fig.2 SEM images and surface roughness of TiN/Cu ?lms deposition for different magnetic field intensity

Fig.3 Relationship between chemical compositions of TiN/Cu ?lms plotted and magnetic field intensity

Fig.4 X-ray photoelectron spectral details collected from the TiN/Cu ?lms with magnetic fiel intensity of 0 Gs (a) and 120 Gs (b)

Fig.5 X-ray different patterns of the TiN/Cu ?lms prepared under different magnetic field intensity

Fig.6 A cross-sectional TEM micrographs (a) and electron diffraction patterns (b) of the TiN/Cu ?lm for magnetic field intensity 80 Gs

Fig.7 Relationship between hardness and elastic modulus of TiN/Cu ?lms and magnetic field intensity

Fig.8 Relationship between H³/E^*2 value (a) and H/E^*value (b) of TiN/Cu ?lms and magnetic field intensity

Fig.9 Relationship between wear rate, friction coefficients and residual stress of TiN/Cu ?lms and magnetic field intensity

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