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| Low-temperature Siliconizing of Silicon Steel Thin Strip with a Nanostructured Surface Layer and Effect of Treatment Parameter |
Gang LIU1,**( ),Chenggang MO1,Yuhui SHA2,Xiang ZHAO2,Liang ZUO2 |
1. Research Academy, Northeastern University, Shenyang 110819, China
2. Key Laboratory of Electromagnetic Processing of Materials, Ministry of Education,
Northeastern University, Shenyang 110819, China |
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Cite this article:
Gang LIU,Chenggang MO,Yuhui SHA,Xiang ZHAO,Liang ZUO. Low-temperature Siliconizing of Silicon Steel Thin Strip with a Nanostructured Surface Layer and Effect of Treatment Parameter. Chinese Journal of Materials Research, 2015, 29(5): 359-364.
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Abstract Silicon steel thin strip was firstly surface shot peened, then cold rolled and finally siliconized by pack cementation process, The microstructural evolution was examined of the steel with the treatment processing. Results show that shot peening can induce the formation of noncrystalline (about 10nm in size) in the top surface layer, the grain size of the noncrystalline increases slightly after cold rolling. A compound layer can be obtained after siliconizing at 500oC in Si powder+halide on the shot peened and cold roll steel strip, its thickness increases with the increasing temperature and holding time, however on which the halide content exhibits little effect. After siliconizing at lower temperature the compound layer consists of single phase Fe3Si, and the increase of temperature, holding time and halide content is helpful for the formation of FeSi phase.
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Received: 26 August 2014
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