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| Effect of Pulsed Bias Voltage on the Microstructures and properties of TiN/TiAlN Multilayer Coatings |
| WEI Yongqiang1,2, TIAN Xiubo1, GONG Chunzhi1, YANG Shiqin1 |
1.State Key Lab of Advanced Welding Production Technology, Harbin Institute of Technology, Harbin 150001
2.School of Mechanical Engineering, Zhengzhou Institute of Aeronautics Industry Management, Zhengzhou 450015 |
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Cite this article:
WEI Yongqiang TIAN Xiubo GONG Chunzhi YANG Shiqin. Effect of Pulsed Bias Voltage on the Microstructures and properties of TiN/TiAlN Multilayer Coatings. Chin J Mater Res, 2011, 25(6): 630-636.
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Abstract TiN/TiAlN multilayer coatings were prepared by arc ion plating with different pulsed bias voltages. With the increase of pulsed bias voltage, the amounts of the macroparticles were largely reduced. The increase of the pulsed bias voltage caused the decrease of Al/Ti atom ratio. The multilayer coatings exhibited growth in preferred orientation of (111) plane with the grain size ranging from 8nm to 14nm. The hardness of TiN/TiAlN multilayer coatings was over 36GPa, which was 3.9 times that of M2 high speed substrate. All the adhesion strength of TiN/TiAlN multilayer coatings was more than 60 N. All the TiN/TiAlN multilayer coatings showed better wear resistance.
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Received: 19 April 2011
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| Fund: Supported by National Nature Science Foundation of China Nos.10905013 & 10975041. |
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