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Effect of Copper Foil Surface Morphology on the Quality of Graphene Grown by CVD |
SONG Ruili1, LIU Ping2,**( ), ZHANG Ke2, LIU Xinkuan2, CHEN Xiaohong2 |
1. School of Mechanical Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China 2. School of Materials Science and Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China |
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Cite this article:
SONG Ruili, LIU Ping, ZHANG Ke, LIU Xinkuan, CHEN Xiaohong. Effect of Copper Foil Surface Morphology on the Quality of Graphene Grown by CVD. Chinese Journal of Materials Research, 2016, 30(4): 255-262.
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Abstract High-quality and few-layered graphene was grown by chemical vapor deposition (CVD) on copper foils, which were pre-treated by etching with 25%HCl or 2 mol/L FeCl3 and then electrochemical polishing in order to improve their surface smoothness. The surface morphology of the copper foils and the deposited graphene were characterized by means of Raman spectroscopy, XRD and SEM etc. The results showed that copper foils with desired surface smoothness would be acquired through etching with 2 mol/L FeCl3 for 30 s and then electrochemical polishing for 60 s by applied voltage of 10 V; Films of layered graphene with less defects could be deposited on the pre-treated copper foils. The thickness of graphene films increased with the increasing time, however for a short deposition time the formed graphene films were discontinuous with poor quality. The monolayered high-quality graphene films could be prepared by depositing for 30 s, whilst the deposition time increased to 60 s a graphite film could form on the surface. In other word, it is necessary to control the deposition on time for growing the desired monolayered graphene films.
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Received: 27 July 2015
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Fund: Supported by Youth Fund of National Natural Science Foundation Project No. 51301106 |
About author: To whom correspondence should be addressed, Tel:18221916398, E-mail:liuping@usst.edu.cn |
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