轴向磁场对电弧离子镀TiN/Cu薄膜性能的影响

doi:10.11901/1005.3093.2017.600

材料研究学报

2018, Vol. 32

Issue (5): 381-387 DOI: 10.11901/1005.3093.2017.600

研究论文

本期目录 | 过刊浏览

轴向磁场对电弧离子镀TiN/Cu薄膜性能的影响

赵升升¹(

), 赵彦辉², 陈伟¹, 费加喜¹, 王铁钢³(

)

1 深圳职业技术学院深圳 518055
2 中国科学院金属研究所沈阳 110016
3 天津职业技术师范大学天津市高速切削与精密加工重点实验室天津 300222

Effect of Axial Magnetic Field on Property of TiN/Cu Films Deposited by Arc Ion Plating

Shengsheng ZHAO¹(

), Yanhui ZHAO², Wei CHEN¹, Jiaxi FEI¹, Tiegang WANG³(

)

1 Shenzhen Polytechnic, Shenzhen 518055, China
2 Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
3 Tianjin University of Technology and Education, Tianjin 300222, China

引用本文:

赵升升, 赵彦辉, 陈伟, 费加喜, 王铁钢. 轴向磁场对电弧离子镀TiN/Cu薄膜性能的影响[J]. 材料研究学报, 2018, 32(5): 381-387.
Shengsheng ZHAO, Yanhui ZHAO, Wei CHEN, Jiaxi FEI, Tiegang WANG. Effect of Axial Magnetic Field on Property of TiN/Cu Films Deposited by Arc Ion Plating[J]. Chinese Journal of Materials Research, 2018, 32(5): 381-387.

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摘要:

使用加可调轴向磁场的电弧离子镀设备在不锈钢基体上制备TiN/Cu薄膜,研究了轴向磁场强度对薄膜微观结构、化学成分、力学性能和耐磨性能的影响。结果表明,在不同强度的磁场下TiN/Cu薄膜具有相同的TiN结构,且以沿TiN(111)面的择优取向为主。随着磁场强度的提高(111)面衍射峰的强度逐渐提高、TiN/Cu薄膜表面的粗糙度先降低后提高、薄膜中Cu的含量逐渐提高、硬度和弹性模量也逐渐提高、薄膜的磨损率先降低后提高。当磁场强度为80 Gs时薄膜的硬度达到约为36 GPa的最大值,耐磨性能最高。

关键词 ： TiN/Cu薄膜, 轴向磁场, 电弧离子镀, 硬度, 耐磨性

Abstract：

TiN/Cu thin films were prepared on stainless steel substrate by arc ion plating with adjustable axial magnetic field. The effect of axial magnetic field intensity on the microstructure, chemical composition, mechanical properties and wear resistance of the films were investigated. Results indicated that all the TiN/Cu thin films deposited by different magnetic field intensity have the same crystallographic structure as TiN with preferential orientation (111). With the increasing magnetic field intensity, the diffraction peak intensity of (111) crystal plane significantly enhanced; the surface roughness of TiN/Cu film decreased first and then increased; the Cu content of the film increased gradually; the hardness and elastic modulus of the TiN/Cu film also increased and the wear rate first decreased then increased. When the magnetic field strength reached 80 Gs, the resulted film possessed the highest hardness about 36 GPa and the optimal wear resistance.

Key words： TiN/Cu films axial magnetic field arc ion plating hardness wear resistance

收稿日期: 2017-10-12

基金资助:资助项目国家自然科学基金(51401128,51301181)

作者简介:

作者简介赵升升,男,1979年生,副教授

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https://www.cjmr.org/CN/10.11901/1005.3093.2017.600 或 https://www.cjmr.org/CN/Y2018/V32/I5/381

图1 磁场增强电弧离子镀系统的示意图

图2 磁场强度不同TiN/Cu薄膜的SEM图像和表面粗糙度

图3 TiN/Cu薄膜的化学成分与磁场强度的关系

图4 磁场强度为0 Gs和120 Gs时TiN/Cu薄膜的XPS

图5 在不同磁场强度下TiN/Cu薄膜的XRD

图6 磁场强度为80 Gs的TiN/Cu薄膜的TEM截面形貌和衍射图谱

图7 TiN/Cu薄膜的硬度和弹性模量与磁场强度的关系

图8 TiN/Cu薄膜的H 3/E *2值(a)和H/E *值(b)与磁场强度的关系

图9 TiN/Cu薄膜的磨损率、摩擦系数和残余应力与磁场强度关系

[1]	Bergmann E, Vogel J, Simmen L.Failure mode analysis of coated tools[J]. Thin Solid Films, 1987, 153(1-3): 219
[2]	Goldfarb I, Pelleg J, Zevin L, et al.Lattice distortion in thin films of IVB metal (Ti, Zr, Hr) nitrides[J]. Thin Solid Films, 1991, 200(1): 117
[3]	Veprek S, Veprek-Heijman M G J, Karvankova P, et al. Different approaches to superhard coatings and nanocomposites[J]. Thin Solid Films, 2005, 476(1): 1
[4]	Voevodin A A, Zabinski J S.Nanocomposite and nanostructured tribological materials for space applications[J]. Composites Science and Technology, 2005, 65(5): 741
[5]	Musil J.Hard and superhard nanocomposite coatings[J]. Surface and Coatings Technology, 2000, 125(1): 322
[6]	Myung H S, Lee H M, Shaginyan L R, et al.Microstructure and mechanical properties of Cu doped TiN superhard nanocomposite coatings[J]. Surface and Coatings Technology, 2003, 163: 591
[7]	Wu H, Zhang X, He X, et al.Wear and corrosion resistance of anti-bacterial Ti-Cu-N coatings on titanium implants[J]. Applied Surface Science, 2014, 317: 614
[8]	Pinakidou F, Katsikini M, Patsalas P, et al.On the nanostructure of Cu in TixCu1-x and TiN/Cu films: a XAFS study[J]. Journal of Nano Research. Trans Tech Publications, 2009, 6: 43
[9]	Li Z G, Miyake S, Kumagai M, et al.Hard nanocomposite Ti-Cu-N films prepared by dc reactive magnetron co-sputtering[J]. Surface and Coatings Technology, 2004, 183(1): 62
[10]	Myung H S, Han J G, Boo J H.A study on the synthesis and formation behavior of nanostructured TiN films by copper doping[J]. Surface and Coatings Technology, 2004, 177: 404
[11]	Aksenov I I, Padalka V G, Tolok V T, et al.Motion of plasma streams from a vacuum arc in a long, straight plasma-optics system[J]. Soviet Journal of Plasma Physics, 1980, 6: 918
[12]	Sanders D M, Pyle E A.Magnetic enhancement of cathodic arc deposition[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1987, 5(4): 2728
[13]	Martin P J, Bendavid A.Review of the filtered vacuum arc process and materials deposition[J]. Thin Solid Films, 2001, 394(1): 1
[14]	Bilek M M M, Yin Y, McKenzie D R, et al. Ion transport mechanisms in a filtered cathodic vacuum arc (FCVA) system [A]. Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on. IEEE[C]. 1996, 2: 962
[15]	Taylor M B, Partridge J G, McCulloch D G, et al. The influence of deposition rate on the stress and microstructure of AlN films deposited from a filtered cathodic vacuum arc[J]. Thin Solid Films, 2011, 519(11): 3573
[16]	Cluggish B P.Transport of a cathodic arc plasma in a straight, magnetized duct[J]. IEEE Transactions on Plasma Science, 1998, 26(6): 1645
[17]	Anders A, Yushkov G Y.Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field[J]. Journal of Applied Physics, 2002, 91(8): 4824
[18]	Oks E M, Brown I G, Dickinson M R, et al.Elevated ion charge states in vacuum arc plasmas in a magnetic field[J]. Applied Physics Letters, 1995, 67(2): 200
[19]	Oks E M, Brown I G, Dickinson M R, et al.Elevated ion charge states in vacuum arc plasmas in a magnetic field[J]. Applied Physics Letters, 1995, 67(2): 200
[20]	Plyutto A A, Ryzhkov V N, Kapin A T.High-velocity streams of vacuum arc plasma[J]. Zh. Eksp. Teor. Fiz, 1964, 47.
[21]	Anders A, Yushkov G, Oks E, et al.Ion charge state distributions of pulsed vacuum arc plasmas in strong magnetic fields[J]. Review of Scientific Instruments, 1998, 69(3): 1332
[22]	Sanders D M.Review of ion-based coating processes derived from the cathodic arc[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1989, 7(3): 2339
[23]	Yoon J S, Han J G.The ion current density and spectroscopic study in a straight magnetic filtering arc deposition system[J]. Surface and Coatings Technology, 1997, 94: 201
[24]	Zhao S S, Du H, Hua W G, et al.The depth distribution of residual stresses in (Ti, Al) N films: Measurement and analysis[J]. Journal of Materials Research, 2007, 22(10): 2659
[25]	Wang T G, Jeong D, Liu Y, et al.Study on nanocrystalline Cr 2 O 3 films deposited by arc ion plating: II. Mechanical and tribological properties[J]. Surface and Coatings Technology, 2012, 206(10): 2638
[26]	Smentkowski V S.Trends in sputtering[J]. Progress in Surface Science, 2000, 64(1): 1
[27]	Tian L, Zhang Y, Ma Y, et al.Effect of Cu content and ion beam bombardment on microstructure and mechanical properties of Cr-Cu-N films[J]. Surface and Coatings Technology, 2013, 228: S495
[28]	Wang H, Shu X, Guo M, et al.Structural, tribological and antibacterial activities of Ti-Cu-N hard coatings prepared by plasma surface alloying technique[J]. Surface and Coatings Technology, 2013, 235: 235
[29]	Martin P J, Bendavid A, Kinder T J.The deposition of TiN thin films by filtered cathodic arc techniques[J]. IEEE Transactions on Plasma Science, 1997, 25(4): 675
[30]	Yu G Q, Tay B K, Lau S P, et al.Effects of N ion energy on titanium nitride films deposited by ion assisted filtered cathodic vacuum arc[J]. Chemical Physics Letters, 2003, 374(3): 264
[31]	Jiménez H, Restrepo E, Devia A.Effect of the substrate temperature in ZrN coatings grown by the pulsed arc technique studied by XRD[J]. Surface and Coatings Technology, 2006, 201(3): 1594
[32]	Pelleg J, Zevin L Z, Lungo S, Croitoru N.Reactive-sputter-deposited TiN films on glass substrates[J]. Thin Solid Films, 1991, 197: 117
[33]	Jiménez H, Restrepo E, Devia A.Effect of the substrate temperature in ZrN coatings grown by the pulsed arc technique studied by XRD[J]. Surface and Coatings Technology, 2006, 201(3): 1594-1601
[34]	Toth L E.Transition Metal Carbides and Nitrides [M]. New York: Academic Press, 1971
[35]	Musil J, Daniel R.Structure and mechanical properties of magnetron sputtered Zr-Ti-Cu-N films[J]. Surface and Coatings Technology, 2003, 166(2): 243
[36]	Davis C A, A simple model for the formation of compressive stress in thin films by ion bombardment[J]. Thin Solid Films, 1993, 226: 30
[37]	Niu E W, Li L, Lv G H,et al. Influence of substrate bias on the structure and properties of ZrN films deposited by cathodic vacuum arc. Materials Science and Engineering A [J].2007, 460-461: 135
[38]	Ge F F, Zhu P, Meng F P, Huang F. Enhancing the wear resistance of magnetron sputtered VN coating by Si addition [J]. Wear , 2016, 354-355: 32

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