薄膜热电偶在高温下的防氧化机理

doi:10.11901/1005.3093.2015.755

材料研究学报

2017, Vol. 31

Issue (2): 123-128 DOI: 10.11901/1005.3093.2015.755

本期目录 | 过刊浏览

薄膜热电偶在高温下的防氧化机理

王超杰^1,²,陈鹏³(

),袁广民⁴,王博⁵

1 国防科学技术大学长沙 410073
2 空间物理重点试验室北京 100076
3 航天科技集团公司四院四十四所西安 710025
4 西北工业大学空天微纳系统教育部重点实验室西安 710072
5 北京市第八中学北京 100033

Anti-oxidation Perfromamnce of Thin Film Thermocouple at High Temperature

Chaojie WANG^1,²,Peng CHEN³(

),Guangmin YUAN⁴,Bo WANG⁵

1 National university of defense technology College of aerospace science and engineering, Changsha 410073, China
2 National Key Laboratory of Science and Technology on Nearspace Vehicle Technology, Beijing 10076, China
3 R&D center, The 44th Institute of CASC, Xi'an 710025, China
4 Ministry of Education Key Laboratory of Micro and Nano Systems for Aerospace, Northwestern Polytechnical University, 127 West Youyi Road, Xi′an 710072, China
5 Beijing No.8 High School, Beijing 100033, China

引用本文:

王超杰,陈鹏,袁广民,王博. 薄膜热电偶在高温下的防氧化机理[J]. 材料研究学报, 2017, 31(2): 123-128.
Chaojie WANG, Peng CHEN, Guangmin YUAN, Bo WANG. Anti-oxidation Perfromamnce of Thin Film Thermocouple at High Temperature[J]. Chinese Journal of Materials Research, 2017, 31(2): 123-128.

全文: PDF(2228 KB) HTML

摘要:

根据金属材料的高温氧化和防氧化特性,研究了不同保护膜对薄膜热电偶防氧化的机理,提出使用SiO₂、SiO_xN_y薄膜作为抗氧化的保护膜。用磁控溅射法分别制备了具有SiO₂和SiO_xN_y保护膜和无保护膜的NiCr-NiSi薄膜热电偶样品,并对三种样品进行高温热处理。结果表明,根据不同样品的XRD图谱中NiO峰的强度,在800℃高温下有SiO_xN_y保护膜的样品其抗氧化效果约为有SiO₂保护膜样品的3~5倍。同时发现,在高温处理过程中SiO_xN_y薄膜发生轻微氧化使SiO_xN_y薄膜结构更致密,有利于提高SiO_xN_y薄膜对温度敏感薄膜的抗氧化性能。

关键词 ：材料表面与界面, 薄膜热电偶, 高温防氧化, 氮氧化硅, 保护膜

Abstract：

The thin-film thermocouple of NiCr-NiSi without and with protective coatings of SiO₂ and SiO_xN_y were respectively manufactured by magnetron sputtering method. Then their oxidation performance was examined at 100~800℃ for 90 mim in air. The results show that the anti-oxidation capacity of the thermocouple with SiO_xN_y coating is 3~5 times higher than that with SiO₂ coating at 800℃ according to the intensities of the diffraction peaks of NiO in XRD spectra of the above two thermocouples. Meanwhile, the slightly oxidization of SiO_xN_y coating during high temperature process can effectively enhance its protectiveness as well.

Key words： surface and interface in the materials thin-film thermocouple high-temperature oxidation SiOxNy protective film

收稿日期: 2015-12-23

基金资助:中央高校基本科研业务费项目(3102015ZY08)

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图1 薄膜热电偶器件的结构示意图

图2 SiOxNy薄膜的本征结构示意图

图3 样品的制备流程

图4 在不同温度退火后NiSi薄膜的XRD图谱

图5 在不同温度退火后NiSi薄膜的表面形貌

图6 有不同保护膜的薄膜热电偶在800℃热处理后的XRD图谱

Fig.7 High resolution XPS patterns of Si 2p和N 1s

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