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Preparation, Thermal Shock and Wear Properties of a N-doped Ta Coating |
NIU Yunsong1,2, ZHU Shenglong2( ), WEN Gangzhu3, WANG Dianrong3, HUANG Jinfeng1, CHEN Minghui4( ), CHEN Qiang5, WANG Fuhui4 |
1.State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing 100083, China 2.Shi -Changxu Innovation Center for Advanced Materials, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China 3.Inner Mongolia North Heavy Industries Group Co., Ltd., Baotou 014030, China 4.Shenyang National Laboratory for Materials Science, Northeastern University, Shenyang 110819, China 5.Southwest Technology and Engineering Research Institute, Chongqing 400039, China |
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Cite this article:
NIU Yunsong, ZHU Shenglong, WEN Gangzhu, WANG Dianrong, HUANG Jinfeng, CHEN Minghui, CHEN Qiang, WANG Fuhui. Preparation, Thermal Shock and Wear Properties of a N-doped Ta Coating. Chinese Journal of Materials Research, 2025, 39(5): 321-328.
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Abstract Conventional magnetron sputtered Ta coating prepared by magnetron sputtering in low pressure Ar atmosphere was always of brittle β phase. Replacing Ar with Kr, Xe and other large atomic gases could increase the proportion of α-Ta within the coating, thus increasing the toughness of the coating. However, Kr and Xe etc. are rare and expensive, which is not suitable for production. In this study, a single-phase α-Ta coating was prepared on 304 stainless steel by magnetron sputtering in low pressure mixed Ar+N2 atmosphere, which is far cheap than the rare gases. By comparing the results of water quenching (thermal shock) test and wear test for the two type coatings, i.e. prepared in low pressure Ar and Ar+N2 respectively, it is found that: Prepared in low pressure Ar atmosphere, the sputtered Ta coating is mainly β-Ta. After 10 cycles of thermal shock, the oxide scale spalls off largely with a loss weight of 10.24 mg/cm2. Its Vickers hardness is HV370, the friction coefficient is 0.556, and the wear loss is as high as 1.9 × 10-3 mm3/(N·m); In the contrast, prepared in low pressure mixed Ar + N2 atmosphere, the sputtered Ta coating is pure α-Ta. After 10 cycles of thermal shock, its loss in weight is only 0.90 mg/cm2, what's more, there is no significant difference in surface morphology before and after thermal shock. Its Vickers hardness is HV1900, the friction coefficient is 0.304, and the wear loss is only 3.7 × 10-4 mm3/(N·m).
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Received: 22 January 2024
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Fund: National Natural Science Foundation of China(51701223) |
Corresponding Authors:
ZHU Shenglong, Tel: (024) 23904856, E-mail: slzhu@imr.ac.cnCHEN Minghui, Tel: (024) 83691562, E-mail: mhchen@mail.neu.edu.cn
|
1 |
Guan S, Zhang Q, Hu R N. Study on mechanism of additives for chromium electrodeposition by XPS and electrochemical methods [J]. Acta Metall. Sin., 2000, 36(11): 1179
|
|
关 山, 张 琦, 胡如南. 利用XPS及电化学方法研究电镀Cr添加剂的作用机理 [J]. 金属学报, 2000, 36(11): 1179
|
2 |
Song Y M, Wen G Z, Zhang J. Technologies to increase barrel life of large-calibre gun [J]. Equip. Environ. Eng., 2022, 19(7): 1
|
|
宋彦明, 温钢柱, 张 杰. 大口径火炮身管寿命提升技术探讨 [J]. 装备环境工程, 2022, 19(7): 1
|
3 |
Myers S, Lin J L, Souza R M, et al. The β to α phase transition of tantalum coatings deposited by modulated pulsed power magnetron sputtering [J]. Surf. Coat. Technol., 2013, 214: 38
|
4 |
Lee S L, Windover D, Audino M, et al. High-rate sputter deposited tantalum coating on steel for wear and erosion mitigation [J]. Surf. Coat. Technol., 2002, 149(1): 62
|
5 |
Maeng S M, Axe L, Tyson T A, et al. Corrosion behavior of magnetron sputtered α-Ta coatings on smooth and rough steel substrates [J]. Surf. Coat. Technol., 2006, 200(20-21): 5717
|
6 |
Lundin D, Sarakinos K. An introduction to thin film processing using high-power impulse magnetron sputtering [J]. J. Mater. Res., 2012, 27: 780
|
7 |
Lin J L, Moore J J, Sproul W D, et al. Effect of negative substrate bias on the structure and properties of Ta coatings deposited using modulated pulse power magnetron sputtering [J]. IEEE Trans. Plasma Sci., 2010, 38(11): 3071
|
8 |
Ferreira F, Sousa C, Cavaleiro A, et al. Phase tailoring of tantalum thin films deposited in deep oscillation magnetron sputtering mode [J]. Surf. Coat. Technol., 2017, 314: 97
|
9 |
Frank S, Gruber P A, Handge U A, et al. In situ studies on the cohesive properties of α- and β-Ta layers on polyimide substrates [J]. Acta Mater., 2011, 59(15): 5881
|
10 |
Ren H, Sosnowski M. Tantalum thin films deposited by ion assisted magnetron sputtering [J]. Thin Solid Films, 2008, 516(8): 1898
|
11 |
Jiang A Q, Tyson T A, Axe L. The structure of small Ta clusters [J]. J. Phys.: Condens. Matter, 2005, 17: 6111
|
12 |
Matson D W, McClanahan E D, Lee S L, et al. Properties of thick sputtered Ta used for protective gun tube coatings [J]. Surf. Coat. Technol., 2001, 146-147: 344
|
13 |
Lee S L, Wei R H, Todaro M, et al. Electroplated and plasma enhanced magnetron sputtered Ta and Cr coatings for high temperature and high pressure operation [J]. MRS Online Proc. Library, 2006, 987: 9870313
|
14 |
Wang S, Xiong D S, Li J L, et al. Wear and erosion resistance properties of electroplating Ta coating in molten salt [J]. China Surf. Eng., 2015, 28(2): 101
|
|
王 升, 熊党生, 李建亮 等. 熔盐电镀钽及其耐磨损烧蚀性能 [J]. 中国表面工程, 2015, 28(2): 101
|
15 |
Cui J T, Liu X L, Tian X B, et al. Microstructures and properties of tantalum film grown by DC magnetron sputtering [J]. Chin. J. Vac. Sci. Technol., 2007, 27(3): 259
|
|
崔江涛, 刘向力, 田修波 等. 直流磁控溅射沉积钽膜的结构与性能研究 [J]. 真空科学与技术学报, 2007, 27(3): 259
|
16 |
Peng X M, Xia C Q, Wu A R, et al. Preparation of Ta-W coating on titanium alloy and its oxidation behavior [J]. Chin. J. Nonferr. Metals, 2015, 25(6): 1567
|
|
彭小敏, 夏长清, 吴安如 等. 钛合金表面Ta-W涂层的制备及循环氧化行为 [J]. 中国有色金属学报, 2015, 25(6): 1567
|
17 |
Guo P. The research of sueface characteristics and corrosion resistance of tantalum thin films deposited on 30CrMnSiNi2A steel by DC bias-voltage sputtering [D]. Harbin: Harbin Institute of Technology, 2011
|
|
郭 平. 30CrMnSiNi2A钢表面二极溅射镀钽层的结构及性能研究 [D]. 哈尔滨: 哈尔滨工业大学, 2011
|
18 |
Arranz A, Palacio C. Composition of tantalum nitride thin films grown by low-energy nitrogen implantation: a factor analysis study of the Ta 4 f XPS core level [J]. Appl. Phys., 2005, 81A: 1405
|
19 |
Goldschmidt H J. Interstitial Alloys [M]. New York: Springer, 1967
|
20 |
Östhagen K, Kofstad P. The reaction between tantalum and nitrogen at 800~1300 oC [J]. J. Less Common Metals, 1963, 5: 7
|
21 |
Cui W F, Cao D, Qin G W. Microstructure and wear resistance of Ti/TiN multilayer films deposited by magnetron sputtering [J]. Acta Metall. Sin., 2015, 51(12): 1531
doi: 10.11900/0412.1961.2015.00115
|
|
崔文芳, 曹 栋, 秦高悟. 磁控溅射沉积Ti/TiN多层膜的组织特征及耐磨损性能 [J]. 金属学报, 2015, 51(12): 1531
doi: 10.11900/0412.1961.2015.00115
|
22 |
Ma Y T, Liu J B, Cui R L, et al. Research on the preparation and performance of Tungsten-Aluminum transmission target for micro-computed tomography by magnetron sputtering [J]. Acta Metall. Sin., 2015, 51(11): 1416
|
|
马玉田, 刘俊标, 霍荣玲 等. 基于磁控溅射法显微CT W-Al透射靶材的制备及其性能研究 [J]. 金属学报, 2015, 51(11): 1416
|
23 |
Sui X D, Li J G, Wang Q, et al. Preparation of Ti1 - x Al x N coating in cutting titanium alloy and its cutting performance [J]. Acta Metall. Sin., 2016, 52(6): 741
|
|
隋旭东, 李国建, 王 强 等. 钛合金切削用Ti1 - x Al x N涂层的制备及其切削性能研究 [J]. 金属学报, 2016, 52(6): 741
doi: 10.11900/0412.1961.2015.00454
|
24 |
Tan M X. Extracting hardness-displacement relations and elastic modulus using nanoindentation loading curves [J]. Acta Metall. Sin., 2005, 41(10): 1020
|
|
谭孟曦. 利用纳米压痕加载曲线计算硬度-压入深度关系及弹性模量 [J]. 金属学报, 2005, 41(10): 1020
|
25 |
Qian Y H, Li M S, Zhang Y M. Cracking and spalling behavior of thin oxide scale [J]. Corros. Sci. Prot. Technol., 2003, 15(2): 90
|
|
钱余海, 李美栓, 张亚明. 氧化膜开裂和剥落行为 [J]. 腐蚀科学与防护技术, 2003, 15(2): 90
|
26 |
Wang S. The preparation of Tantalum coating and the research of wear and ablation resistance [D]. Nanjing: Nanjing University of Science & Technology, 2015
|
|
王 升. 钽涂层的制备及其磨损与烧蚀性能研究 [D]. 南京: 南京理工大学, 2015
|
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