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| Kinetic Monte Carlo Simulation of Thin Film Growth Including Two--dimensional Ehrlich--Schwoebel Barrier |
| ZHU Yiguo，RONG Haibo |
| State Key Laboratory of Structural Analysis for Industrial Equipment, Department of Engineering Mechanics, Dalian University of Technology, Dalian 116023 |
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Cite this article:
ZHU Yiguo RONG Haibo. Kinetic Monte Carlo Simulation of Thin Film Growth Including Two--dimensional Ehrlich--Schwoebel Barrier. Chin J Mater Res, 2012, 26(2): 119-124.
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Abstract A kinetic Monte Carlo model describing the three–dimensional thin film growth on square lattice substrates was presented, in which the two–dimensional Ehrlich–Schwoebel barrier for an adatom to diffuse down a surface step was taken into account. Three principle dynamic processes, namely deposition, diffusion and re–evaporation were included in the description of surface motion of the adatoms. It is considered that these three dynamic processes are interact on each other and will occur randomly according to their rates. Three growth modes and corresponding island morphologies under different growth conditions were simulated. By analysing the simulate results, It is educed that the important influence of Ehrlich–Schwoebel Barrier on surface morphology, and under the action of Ehrlich–Schwoebel Barrier, the temperature of substrate and deposition rate also play an important role in thin film growth modes.
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Received: 19 April 2010
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| Fund: Supported by the National Basic Research Program under the Grant 2005CB321704 , National Natural Science Foundation of China No.10925209 and the Fundamental Research Funds for the Central Universities No.DUT10LK42. |
| 1 WANG Enge, Atomic–scale study of kinetics in film growth(I), Progress in Physics, 23(1), 1(2003)(王恩哥, 薄膜生长中的表面动力学(I), 物理学进展, 23(1), 1(2003))2 MAO Huibing, JING Weiping, YU Jianguo, WANG Jiqing, WANG Li, DAI Ning, Kinetic Monte Carlo simulation of the epitaxial growth mechanism on the vicinal surface, Acta Physica Sinica, 5510), 5435(2006)(毛惠兵, 景为平, 俞建国, 王基庆, 王 力, 戴 宁, 邻晶面外延生长机制的动力学Monte Carlo模拟, 物理学报, 5510), 5435(2006))3 G.Enrlich, F.G.Hudda, Atomic view of surface self–diffusion: Tungsten on tungsten, J. Chem. Phys., 44, 1039(1966)4 R.L.Schwoelbel, E.J.Shipesy, Step motion on crystal surfaces, J. Appl. Phys., 37, 3682(1966)5 J.K.Zuo, J.F.Wendelken, Evolution of Mound Morphology in Reversible Homoepitaxy on Cu(100), Phys. Rev. Lett., 78, 2791(1997)6 F.M.Wu, H.J.Lu, Z.Q.Wu, Simulation of multilayer homoepitaxial growth on Cu(100) surface, Chinese Physics, 15(4), 807(2006)7 S.J.Liu, Hanchen Huang, C.H.Woo, Schwoebel–Ehrlich barrier: from two to three dimensions, Appl. Phys. Lett., 80, 3295(2002)8 S.J.Liu, E.G.Wang, C.H.Woo, Hanchen Huang, Three–dimensional Schwoebel–Ehrlich barrier, J. Compu. Aided Materials Design, 7, 195(2001)9 LI Jiayang, LI Rongwu, SUN Jundong, LIU Shaojun, Computation of the Ehrlich–Schwoebel barrier to adatom diffusion in heteroepitaxial systems, Acta Physica Sinica, 56, 446(2007)(李佳阳, 李荣武, 孙俊东, 刘绍军, 异质扩散过程中ES势垒的计算, 物理学报, 56, 446(2007))10 M.G.Lagally, Z.Y.ZHANG, Materials science: Thin–film cliffhanger, 417, 907(2002)11 ZHU Yiguo, Three dimensional Monte Carlo model of thin film growth, 23(6), 640(2009)(朱祎国, 薄膜生长的三维蒙特卡罗模型, 材料研究学报, 23(6), 640(2009))12 ZHANG Peifeng, ZHENG Xiaopeng, HE Deyan, Monte Carlo simulation of thin film growth, Since in China, G33(4), 340(2003)(张佩锋, 郑小平, 贺德衍, 薄膜生长的Monte Carlo 模拟, 中国科学, G33(4), 340(2003))13 LIU Zuli, ZHANG Xuefeng, YAO Kailun, HUANG Yunmi, Monte Carlo simulation of Cu thin film growth by magnetron sputtering, Chinese Journal of Vacuum Science and Technology, 25(2), 83(2005)(刘祖黎, 张雪峰, 姚凯伦, 黄运米, 溅射沉积Cu膜生长的Monte Carlo模拟, 真空科学与技术学报, 25(2), 83(2005))14 LIU Zuli, WEI Helin, WANG Hanwen, WANG Junzhen, A random model of thin film growth, Acta Physica Sinica, 48(7), 1302(1999)(刘祖黎, 魏合林, 王汉文, 王均震, 薄膜生长的随机模型, 物理学报, 48(7), 1302(1999))15 P.Bruschi, P.Cagnoni, A.Nannini, Temperature–dependent Monte Carlo simulations of thin metalfilm growth and percolation. Phys. Rev. B, 55 (12), 7955(1997)16 J.A.Meyer, J.Vrijmoeth, H.A.van der Vegt, E.Vlieg, R.J.Behm, Importance of the additional step–edge barrier in determining film morphology during epitaxial growth, Phys. Rev. B., 51, 14790(1995)17 Z.Y.ZHANG, M.G.Layally, Atomic–scale mechanisms for surfactant–mediated layer–by–layer growth in homoepitaxy, Phys. Rev. Lett., 72, 693 (1994) |
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