低能大流强氢离子辐照对钨的刻蚀行为

doi:10.11901/1005.3093.2020.126

材料研究学报

2020, Vol. 34

Issue (9): 659-664 DOI: 10.11901/1005.3093.2020.126

研究论文

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低能大流强氢离子辐照对钨的刻蚀行为

玄京凡, 范红玉(

), 白樱, 胡瑞航, 李昕洋, 陶文辰, 倪维元(

), 牛金海

大连民族大学辽宁省等离子技术重点实验室大连 116600

Etching Behavior of Tungsten under Irradiation of Low Energy and High Flux Hydrogen Ions

XUAN Jingfan, FAN Hongyu(

), BAI Ying, HU Ruihang, LI Xinyang, TAO Wenchen, NI Weiyuan(

), NIU Jinhai

Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116600, China

引用本文:

玄京凡, 范红玉, 白樱, 胡瑞航, 李昕洋, 陶文辰, 倪维元, 牛金海. 低能大流强氢离子辐照对钨的刻蚀行为[J]. 材料研究学报, 2020, 34(9): 659-664.
Jingfan XUAN, Hongyu FAN, Ying BAI, Ruihang HU, Xinyang LI, Wenchen TAO, Weiyuan NI, Jinhai NIU. Etching Behavior of Tungsten under Irradiation of Low Energy and High Flux Hydrogen Ions[J]. Chinese Journal of Materials Research, 2020, 34(9): 659-664.

全文: PDF(18017 KB) HTML

摘要:

在聚变相关的钨(W)偏滤器辐照下，研究了低能大流强氢(H)离子辐照对多晶钨材料的刻蚀行为。使用扫描电子显微镜(SEM)、导电原子力显微镜和基于SEM的电子背散射衍射等手段研究了大流强(~10²² ions/m²·s)、剂量为1.0×10²⁶ ions/m²、能量为5~200 eV的氢离子辐照对多晶W材料表面刻蚀行为的影响。结果表明，随着H离子辐照能量的增加W的溅射率迅速提高，W表面发生刻蚀后产生条纹状结构，而且同一晶粒上条纹的方向具有一致性，条纹两侧的缺陷分布明显不同，意味着W表面的刻蚀优先沿某一特定晶面方向进行。

关键词 ：金属学, 多晶钨, 氢离子辐照, 刻蚀

Abstract：

Regarding to conditions of the fusion-related tungsten (W) divertor, the etching behavior of polycrystalline W under the irradiation of low-energy and high-flux hydrogen ions, namely the flux of ca 10²² ions/m²·s, dose of 1.0×10²⁶ ions/m²and energy of 5~200 eV was investigated by means of scanning electron microscopy SEM with EBSD and conductive atomic force microscopy. The findings suggest that the sputtering yield of W is strongly dependent on the ions energy, the sputtering rate increases rapidly with the increase of H ions energy; After irradiation, a texture of parallel stripes with a special orientation for every grain may emerge on the irradiated surface, but the distribution of defects on both sides of every stripe is obviously different, which means that the etching of W surface is preferentially occur along a certain face of W crystal grains.

Key words： metallography polycrystalline tungsten H ions irradiation erosion

收稿日期: 2020-04-17

ZTFLH:

TG14

基金资助:国家自然科学基金(11405023);辽宁省自然科学基金(20180510006);辽宁省自然科学基金(2019-ZD-018);大连市青年科技之星项目(2017RQ149);大连民族大学大学生创新创业训练项目(202012026596);大连民族大学“太阳鸟”学生科研项目(tyn2020302)

作者简介: 玄京凡，女，2001年生，本科生

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链接本文:

https://www.cjmr.org/CN/10.11901/1005.3093.2020.126 或 https://www.cjmr.org/CN/Y2020/V34/I9/659

图1 H等离子体发射光谱诊断

图2 不同H离子能量辐照下W表面的SEM照片

图3 200 eV的 H离子辐照后W表面的SEM照片和对应的EBSD图

图4 W溅射率随H离子能量的变化

图5 采用导电原子力显微镜分析不同离子能量辐照后钨的表面形貌(左图)和缺陷电流分布图像(右图)

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