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Chin J Mater Res  1992, Vol. 6 Issue (3): 236-240    DOI:
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MICROSTRUCTURE AND OPTICAL PROPERTIES OF THE AIN FILMS DEPOSITED BY ION BEAM ENHANCED REACTIVE MAGNETRON SPUTTERING
WANG Hao;HUANG Rongfang;HONG Ruijiang;WU Jie;WEN Lishi(Institute of Metal Research;Academia Sinica)
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WANG Hao;HUANG Rongfang;HONG Ruijiang;WU Jie;WEN Lishi(Institute of Metal Research;Academia Sinica). MICROSTRUCTURE AND OPTICAL PROPERTIES OF THE AIN FILMS DEPOSITED BY ION BEAM ENHANCED REACTIVE MAGNETRON SPUTTERING. Chin J Mater Res, 1992, 6(3): 236-240.

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Abstract  Microstructure,crystallography,electron structure and optical properties ofaluminum nitride film deposited by ion beam enhanced reactive magnetron sputtering were stu-died.The results show that the microstructure of the film is uniform and the grain size
Key words:  thin films      AIN      magnetron sputtering     
Received:  25 June 1992     
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