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Chin J Mater Res  1992, Vol. 6 Issue (4): 315-319    DOI:
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CHARACTERIZATION OF DLC FILMS PREPARED BY DUAL-ION BEAM SPUTTERING DEPOSITION
WANG Weijie;WANG Tianmin;HAN Peigang(Lanzhou University)LUO Chongtai;HUANG Liangfu;LIU Dingquan(Physics Research Institute of Lanzhou;Chinese A cademy of Space Technology)
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WANG Weijie;WANG Tianmin;HAN Peigang(Lanzhou University)LUO Chongtai;HUANG Liangfu;LIU Dingquan(Physics Research Institute of Lanzhou;Chinese A cademy of Space Technology). CHARACTERIZATION OF DLC FILMS PREPARED BY DUAL-ION BEAM SPUTTERING DEPOSITION. Chin J Mater Res, 1992, 6(4): 315-319.

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Abstract  Using dual-ion beam sputtering deposition method,DLC films were depositedon glass and silicon substrate under different CH_4 flow ratios(CH_4/(CH_4+Ar)from 0% to100%)in bombarding ion source.The structures and the properties of the films were systemati-ca
Key words:  Dual-ion beam sputtering deposition      DLC films      thin film growth      structure      properties     
Received:  25 August 1992     
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