NOVEL TECHNIQUE OF PROCESSING SILICON MEMBRANE FOR ELECTROCHEMICAL ETCH-STOP

Chin J Mater Res

1990, Vol. 4

Issue (6): 530-533 DOI:

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NOVEL TECHNIQUE OF PROCESSING SILICON MEMBRANE FOR ELECTROCHEMICAL ETCH-STOP

ZHANG Zuolan(Southeast University)

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ZHANG Zuolan(Southeast University). NOVEL TECHNIQUE OF PROCESSING SILICON MEMBRANE FOR ELECTROCHEMICAL ETCH-STOP. Chin J Mater Res, 1990, 4(6): 530-533.

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Abstract Novel technique of electrochemical etch-stop for high-precision thicknesscontrol of silicon membrane was presented in this paper.The influences of light irradiationand ohm contact of electrode on etch characterization were discussed.Quality of the silicon

Key words: electrochemical etch etch-stop membrane sol material

Received: 25 December 1990

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https://www.cjmr.org/EN/ OR https://www.cjmr.org/EN/Y1990/V4/I6/530

1 Bean K E.IEEE Transactions on Electron Devices,1978;25(10) :1185
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