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| 基片温度对微晶硅薄膜微观结构和光学性能的影响 |
| 程华1,2, 王萍2, 崔岩2, 吴爱民3, 石南林1 |
1.中国科学院金属研究所 沈阳 110016
2.中国人民解放军装甲兵技术学院 长春 130117
3.大连理工大学 大连 116024 |
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| Influence of Substrate Temperature on Microstructure and Optical Properties of Microcrystalline Si Films |
| CHENG Hua1,2, WANG Ping2, CUI Yan2, WU Aimin3, SHI Nanlin1 |
1.Institute of metal research, Chinese Academy of Sciences, Shenyang 110016
2.Armor technique institute of PLA, Changchun 130117
3.Dalian university of technology, Dalian 116024 |
引用本文:
程华 王 萍 崔 岩 吴爱民 石南林. 基片温度对微晶硅薄膜微观结构和光学性能的影响[J]. 材料研究学报, 2011, 25(4): 408-412.
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Influence of Substrate Temperature on Microstructure and Optical Properties of Microcrystalline Si Films[J]. Chin J Mater Res, 2011, 25(4): 408-412.
| 1 N.H.Nickel, N.M.Johnson, J.Walker, Hydrogen induced generation of acceptorlike defects in polycrystalline silicon, Physical Review Letters, 75(20), 3720(1995)2 G.Tureban, Y.Catherine, B.Grolleau, Mass spectrometry of a silane glow discharge during plasma deposition of a-Si: H films, Thin Solid Films, 67, 309(1980)3 Cheng Hua, Wu Aimin, Shi Nanlin, Wen Lishi, Effect of Ar on polycrystalline Si films deposited by ECR-PECVD using SiH4, Journal of Material Science and Technology, 24(5), 690(2008)4 Cheng Hua, Wu Aimin, Xiao Jinquan, Shi Nanlin, Wen Lishi, Effect of substrate temperature on the growth of polycrystalline Si films deposited with SiH4+Ar, Journal of Material Science and Technology, 25(3), 489(2009)5 CHENG Hua, ZHANG Xin, ZHANG Guangcheng, LIU Ruhong, WU Aimin, SHI Nanlin, The preparation of microcrystalline Si films deposited by ECR-PECVD using SiH4+Ar, Chinese Journal of Materials Research, 24(5), 547(2010) (程 华, 张 昕, 张广城, 刘汝宏, 吴爱民, 石南林, 用等离子增强化学气相沉积制备微晶硅薄膜, 材料研究学报, 24(5), 547(2010))6 LI Shibin, WU Zhiming, ZHU Kuipeng, Effect of substrate temperature on the optical properties of a–Si:H films by RF–PECVD, Acta Phys. Chim. Sin., 23(8), 1252(2007)(李世彬, 吴志明, 朱魁鹏, 衬底温度对RF--PECVD法制备微晶硅薄膜光学性能影响, 物理化学学报, 23(8), 1252(2007))7 Madhusudan Jana, Debajyoti Das, A.K. Barua, Promotion of microcrystallization by argon in moderately hydrogen diluted silane plasma, Solar Energy Materials and Solar Cells, 74, 407(2002)8 Debajyoti Das, Madhusudan Jana, A.K.Barua, Heterogeneity in microcrystalline-transition state: Origin of Sinucleation and microcrystallization at higher rf power from Ar-diluted SiH4 plasma, Journal of Applied Physics, 89, 3041(2001)9 M.Zhu, Y.Cao, X.Guo, Microstructure of poly-Si thin films prepared at low temperatures, Solar Energy Materials and Solar Cells, 62, 109(2000)10 Wen-Chu Hsiaoa, Chuan-Pu Liua, Ying-Lang Wang, Thermal properties of hydrogenated amorphous silicon prepared by high-density plasma chemical vapor deposition, Journal of Physics and Chemistry of Solids, 69, 648(2008)11 E.Vallat-Sauvain, U.Kroll, J. Meier, Microstructure and surface roughness of microcrystalline silicon prepared by very high frequency-glow discharge using hydrogen dilution, Journal of Non-crystalline Solids, 266-269, 125(2000)12 M.Vaneeek, Optical properties of microcrystalline materials, Journal of Non-crystalline Solids, 227–230, 967(1998)13 N.Beck, J.Meier, J.Fric, Enhanced optical absorption in microcrystalline silicon, Journal of Non-crystalline Solids, 198–200, 903(1996)14 Wataru Futako, Kunihiko Yoshino, Charles M. Fortmann, Wide band gap amorphous silicon thin films prepared by chemical annealing, Journal of Applied Physics, 85, 812(1999)15 O.Vetterl, A.Groβ, T.Jana, Changes in electric and optical properties of intrinsic microcrystalline silicon upon variation of the structural composition, Journal of Non-Crystalline Solids, 299–302, 772(2002)16 Purabi Gogoi, Pratima Agarwal, Structural and optical studies on hot wire chemical vapour deposited hydrogenated silicon films at low substrate temperature, Solar Energy Materials and Solar Cells, 93, 199(2009) |
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