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| 用等离子体增强化学气相沉积制备微晶硅薄膜 |
| 程华, 张昕, 张广城, 刘汝宏 |
1.中国科学院金属研究所 沈阳 110016
2.中国人民解放军装甲兵技术学院 长春 130117
3.大连理工大学 大连 116024 |
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| The Preparation of Microcrystalline Si Films Deposited by ECR-PECVD Using SiH4+Ar |
| CHENG Hua, ZHANG Xin, ZHANG Guangcheng, LIU Ruhong, WU Aimin, SHI Nanlin |
1.Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016
2.Armor Technique Institute of PLA, Changchun 130117
3.Dalian University of Technology, Dalian 116024 |
引用本文:
程华 张昕 张广城 刘汝宏. 用等离子体增强化学气相沉积制备微晶硅薄膜[J]. 材料研究学报, 2010, 24(5): 547-549.
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The Preparation of Microcrystalline Si Films Deposited by ECR-PECVD Using SiH4+Ar[J]. Chin J Mater Res, 2010, 24(5): 547-549.
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