低温反应溅射沉积α-(Al,Cr)2O3膜

doi:10.11901/1005.3093.2017.398

材料研究学报

2018, Vol. 32

Issue (4): 278-282 DOI: 10.11901/1005.3093.2017.398

研究论文

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低温反应溅射沉积α-(Al,Cr)₂O₃膜

邱万奇¹(

), 王书林¹, 程奕天¹, 刘仲武¹, 钟喜春¹, 焦东玲¹, 周克崧^1,²

1 华南理工大学材料科学与工程学院广州 510640
2 广东省科学院广东省新材料研究所广州 510650

Low-temperature Deposition of α-(Al,Cr)₂O₃ Films by Reactive Sputtering Method

Wanqi QIU¹(

), Shulin WANG¹, Yitian CHENG¹, Zhongwu LIU¹, Xichun ZHONG¹, Dongling JIAO¹, Kesong ZHOU^1,²

1 College of Materials Science and Engineering, South China University of Technology, Guangzhou 510640, China
2 Guangdong Research Institute of New Materials, Guangdong Academy of Sciences, Guangzhou 510650, China

引用本文:

邱万奇, 王书林, 程奕天, 刘仲武, 钟喜春, 焦东玲, 周克崧. 低温反应溅射沉积α-(Al,Cr)₂O₃膜[J]. 材料研究学报, 2018, 32(4): 278-282.
Wanqi QIU, Shulin WANG, Yitian CHENG, Zhongwu LIU, Xichun ZHONG, Dongling JIAO, Kesong ZHOU. Low-temperature Deposition of α-(Al,Cr)₂O₃ Films by Reactive Sputtering Method[J]. Chinese Journal of Materials Research, 2018, 32(4): 278-282.

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摘要:

使用AlCr合金靶材在高功率脉冲磁控溅射系统中低温反应溅射沉积氧化物薄膜,并与使用纯Al靶反应溅射的薄膜对比。用纳米压痕仪测量薄膜的力学性能,使用扫描电镜(SEM)、掠入射X射线衍射(GIXRD)和能谱仪(EDS)等手段研究了沉积薄膜的表面形貌、相结构和元素组成。结果表明,反应溅射Al时靶表面火花放电严重且工艺不稳定,因此所沉积的薄膜表面粗糙、疏松,硬度低;而反应共溅射AlCr能抑制靶表面火花放电,沉积薄膜平整、致密且硬度高;在540℃和10%氧分压条件下,可沉积出以α-(Al,Cr)₂O₃为主的刚玉型结构氧化物薄膜。

关键词 ：材料表面与界面, 氧化物薄膜, α-(Al,Cr)₂O₃, 高功率脉冲磁控溅射, AlCr合金靶, 纳米压痕

Abstract：

The corundum structure oxide films were successfully deposited by HPPMS (High Power Pulsed Magnetron Sputtering) method by reactive sputtering Al- and AlCr alloy-target respectively at low-temperature. The surface morphology, phase constituent, chemical composition and mechanical property of the as-deposited films were analyzed by SEM (Scanning Electron Microscopy), GIXRD (Grazing Incidence X-ray Diffraction), EDS (Energy Dispersive Spectroscopy) and Hysitron TI 950 nanoindentation, respectively. Results show that Al₂O₃ films deposited by sputtering Al target contain a large number of droplet-particles caused by micro-arcing on the target-surface during reactive sputtering process. The droplet-particles not only increase the surface roughness but micro-porosity in the film as well, which then greatly decreases the film hardness. The micro-arcing can be effectively eliminated by using Al-50% Cr alloy target. The stable sputtering process ensures the deposition of smooth and compact films, thereby increases the film hardness greatly. The corundum phase films of α-(Al,Cr)₂O₃ could be fabricated at 540℃ and 10% O₂ partial pressure.

Key words： surface and interface in the materials oxide films α-(Al,Cr)₂O₃ high power pulsed magnetron sputtering AlCr alloy target nanoindentation

收稿日期: 2017-07-03

基金资助:资助项目国家自然科学基金(51271079),广东省自然科学基金(2015A030313223)

作者简介:

作者简介邱万奇,男,1964年生,教授

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https://www.cjmr.org/CN/10.11901/1005.3093.2017.398 或 https://www.cjmr.org/CN/Y2018/V32/I4/278

图1 使用AlCr靶和Al靶在540℃和10%氧分压条件下沉积的薄膜表面和断面(插图)SEM形貌

图2 使用AlCr合金靶和Al靶沉积出的薄膜的GIXRD谱

图3 不同温度沉积的薄膜的EDS能谱

图4 高功率脉冲溅射的Al2O3和α-(Al,Cr)2O3薄膜的纳米压痕曲线(540℃+10%O2)

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