XPS ANALYSIS OF RF-SPUTTERED SiC THIN FILMS

Chin J Mater Res

1989, Vol. 3

Issue (3): 245-248 DOI:

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XPS ANALYSIS OF RF-SPUTTERED SiC THIN FILMS

TANG Haipeng WANG Yinghua TIAN Minbo (Tsing Hua University)

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TANG Haipeng WANG Yinghua TIAN Minbo (Tsing Hua University). XPS ANALYSIS OF RF-SPUTTERED SiC THIN FILMS. Chin J Mater Res, 1989, 3(3): 245-248.

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Abstract The structural characteristics of RF-sputtered SiC thin filmshas been analysed by XPS technique.The chemical shift defined bythe relative shift of Si(2p) and C(1s) peaks,as well as the loss energiesof the plasmon loss features observed in the spectra were

Key words: SiC RF-sputtered film chemical shift plasmon loss feature

Received: 25 June 1989

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