β-In2Se3 堆垛缺陷的电子显微学研究
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Electron Microscopy Study of Stacking Defects in β-In2Se3
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通讯作者: 刘志博,副研究员,zbliu@imr.ac.cn,研究方向为二维材料电子显微学
责任编辑: 黄青
收稿日期: 2023-05-15 修回日期: 2023-10-21
基金资助: |
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Corresponding authors: LIU Zhibo, Tel:
Received: 2023-05-15 Revised: 2023-10-21
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作者简介 About authors
王 强,男,1997年生,硕士生
基于像差校正扫描透射电子显微学和第一性原理计算,研究了van der Waals(范德瓦尔斯)层状β-In2Se3中堆垛缺陷的原子构型。结果表明,在2H β-In2Se3中存在大量的置换型层错(RSF)和滑移型层错(SSF),发现了一种在热力学上易自发形成的T相滑移型堆垛层错(tSSF);在3R β-In2Se3中只观察到一种能量较高的滑移型层错;2H和3R β-In2Se3以界面连续过渡的方式发生相分离。本文还构建9种β-In2Se3潜在的堆垛层错构型,并计算了相应的堆垛层错能并从能量角度分析了堆垛层错的成因。最后,指出建立分类术语描述类van der Waals层状材料堆垛层错的必要性。
关键词:
In2Se3 has recently received much attention because of its excellent ferroelectric, thermoelectric, and photoelectric properties. However, the stacking defects, known as an important factor affecting the properties of van der Waals layered materials, have not yet been explored for In2Se3. Herein, the atomic configurations of stacking defects in van der Waals layered β-In2Se3 were studied by means of aberration-corrected scanning transmission electron microscopy combined with first-principles calculations. There are a significant amount of replacement-type stacking faults (RSFs) and slip-type stacking faults (SSFs) in 2H β-In2Se3. Moreover, the 1T phase slip-type stacking fault (tSSF), which is thermodynamically prone to spontaneous formation, was observed in 2H β-In2Se3. However, only the SSF was observed as a high energy configuration in 3R β-In2Se3. The phase separation occurred between 2H and 3R β-In2Se3 with a coherent stacking interface. In addition, nine potential stacking fault configurations of β-In2Se3 were constructed, the corresponding stacking fault energies were calculated, and the causes of stacking faults were analyzed from an energetic perspective. Finally, the need for a classification term describing the stacking faults in van der Waals-like layered materials is pointed out.
Keywords:
本文引用格式
王强, 朱鹤雨, 刘志博, 朱毅, 刘培涛, 任文才.
WANG Qiang, ZHU Heyu, LIU Zhibo, ZHU Yi, LIU Peitao, REN Wencai.
Van der Waals(vdW,范德瓦尔斯)层状材料,是一类层内原子通过共价键结合、层间为范德瓦尔斯相互作用的材料。1T(AA)、2H(AB)和3R(ABC)是vdW层状材料常见的三种堆垛构型[1]。当堆垛构型改变时,层与层之间的耦合作用也相应改变,从而赋予材料新的物理性质[2~9]。例如,ABA堆垛的三层石墨烯是零带隙半金属,而ABC堆垛的三层石墨烯是带隙可调谐的半导体[4,5];AA堆垛的双层二硫化钼比AB堆垛构型具有更高的开/关比[6];作为晶体缺陷,堆垛层错能使少层磷烯发生从直接带隙到间接带隙的转变[7]、破坏GeSe的对称性而使其产生铁电性[8]、也能加强CrI3的层间耦合作用[9]。
In2Se3是一种多形体材料,主要含有α、β、γ、δ和κ五种相结构[10,11],其中α-和β-In2Se3是常见且稳定的vdW层状材料。由于α-In2Se3具有面内面外耦合的铁电性[12~16]、压电性[17]、高热释电系数[18]和高光响应性[19],近年来备受关注,在铁电场效应晶体管[20~22]、热电转换[23]和光电探测[19]等领域有极大的应用潜力。与α-In2Se3相比,β-In2Se3具有更高的电子迁移率[24],更高的光响应率[25]和更短的光响应时间[26],优于大多数二维材料基光电探测器。同时,研究人员发现β-In2Se3的结构畸变能诱发产生面内反铁电性和铁弹性[27,28]。因此,作为In2Se3的家族成员,β-In2Se3也越来越受到人们的关注。作为在van der Waals层状材料中普遍存在的晶体缺陷,堆垛层错将破坏β-In2Se3原子排列的周期性和局域对称性,从而对电学、光电、铁电和铁弹等诸多物理性质产生潜在影响。但是迄今为止,这种堆垛缺陷的原子级构型尚未在β-In2Se3中得以揭示。鉴于此,本文基于像差校正扫描透射电子显微学(STEM)结合第一性原理计算系统研究van der Waals层状材料β-In2Se3堆垛缺陷的原子结构,构建堆垛层错构型和计算堆垛层错能,并从能量角度分析β-In2Se3堆垛层错的成因。
1 实验方法
1.1 电子显微学结构解析
用化学气相输运(CVT)法制备块体β-In2Se3样品[29]。用微机械剥离法将少层β-In2Se3从大块样品上剥离到SiO2/Si衬底上,少层β-In2Se3样品暴露的边缘多为能量低的低指数晶体学面{1
实验用透射电镜的型号为FEI Titan cubic Themis G2 300,操作电压300 kV,配备高亮度场发射枪(X-FEG)、双球差校正器、四探头超级能谱仪以及GIF能量过滤系统。采用高角环形暗场-扫描透射电子显微学(HAADF-STEM)方式成像,相机的长度和会聚半角分别为115 mm和29.4 mrad,收集半角为47~200 mrad,束流为35 pA。
1.2 第一性原理计算
2 实验结果
图1中的HAADF-STEM图像显示了2H和3R β-In2Se3在原子尺度上的本征堆垛构型。在HAADF-STEM图像中In和Se原子表现出不同的强度,近似与原子序数的平方成正比(~Z 2)[36]。β-In2Se3是一种具有Se-In-Se-In-Se结构的五原子层(QL)范德瓦尔斯层状材料,其中In原子位于Se八面体中。2H β-In2Se3呈现
图1
图1
2H和3R β-In2Se3的本征堆垛结构
Fig.1
Intrinsic stacking sequence of 2H and 3R β-In2Se3. (a) Atomic-scale HAADF-STEM image of the 2H β-In2Se3 with the stacking sequence of
图2a给出了2H β-In2Se3的低倍截面HAADF-STEM图像,插图给出了相应的快速傅里叶变换(FFT)谱。该FFT谱沿着c轴方向出现拉线,表明2H β-In2Se3存在堆垛缺陷。为了揭示堆垛缺陷的结构特征,在样品的不同位置拍摄了一系列原子尺度HAADF-STEM图像。图2b给出的堆垛构型为
图2
图2
2H β-In2Se3的堆垛层错结构
Fig.2
Stacking fault of 2H β-In2Se3 (a) A low-magnification cross-sectional HAADF-STEM image of the 2H β-In2Se3. The inset is the corresponding FFT patten, (b) Atomic-scale HAADF-STEM image of 2H β-In2Se3 with a RSF indicated by the black dashed line, (c) Atomic-scale HAADF-STEM image of 2H β-In2Se3 with SSFs indicated by the blue dashed lines, (d) Atomic-scale HAADF-STEM image of 2H β-In2Se3 with a high density of RSFs and SSFs. The positions of RSFs and SSFs are denoted by the black and blue dashed lines, respectively, (e) Atomic-scale HAADF-STEM image of 2H β-In2Se3 with a tSSF indicated by the red dashed line
图3给出了3R β-In2Se3原子尺度的HAADF-STEM图像,显示出
图3
图3
3R β-In2Se3的堆垛层错结构
Fig.3
Atomic-scale HAADF-STEM image of the 3R β-In2Se3 with a SSF (tISF) denoted by the blue dashed line
图4
图4
2H和3R β-In2Se3的界面结构
Fig.4
Interface structure of 2H and 3R β-In2Se3 (a) The formation of 3R β-In2Se3 on 2H phase,(b) Atomic-scale HAADF-STEM image of the interface structure between 2H and 3R β-In2Se3
式中ESF和E0分别为含有和不含有堆垛缺陷的超胞的总能量,A为堆垛层错面的面积,n为堆垛层错面的个数。表1列出了9种β-In2Se3的堆垛层错构型及其堆垛层错能,堆垛构型均为12层QL超胞,层错面的位置均用符号“|”标记。同时,根据第一性原理计算出3R、2H和1T β-In2Se3的形成能分别为-30.86、-30.67和-30.22 eV。这表明,3R相最稳定,2H相次之,而1T相的稳定性最低;计算出的超胞c轴晶格常数也列在表1中。可以看出,1T相堆垛构型的晶格常数最大,2H相次之,3R相最小,表明层间相互作用依次增强。上述两点解释了在合成的β-In2Se3中只观察到2H和3R相而没有观察到1T相的原因,与1T相很少被报道的结果一致。3R相的堆垛层错密度低于2H相的实验观测结果,也可根据相稳定性和层间相互作用得以说明。
表1 β-In2Se3的层错构型及其对应的堆垛层错能
Table 1
Configuration | Stacking fault | c / nm | n | SFE / mJ·m-2 |
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2H β-In2Se3 | 11.057 | - | - | |
tISF | 11.067 | 2 | 99.9 | |
RSF | 11.054 | 2 | 6.3 | |
SSF | 11.056 | 2 | 11.3 | |
ISF | 11.020 | 4 | -13.3 | |
tSSF | 11.024 | 2 | -28.8 | |
3R β-In2Se3 | 10.935 | - | - | |
SSF(tISF) | 10.999 | 3 | 124.7 | |
rISF | 10.984 | 6 | 41.2 | |
1T β-In2Se3 | 11.234 | - | - | |
rISF | 11.234 | 2 | -49.2 | |
SSF | 11.157 | 3 | -107.5 |
3 讨论
在2H β-In2Se3中,RSF和SSF的堆垛层错能分别为6.3和11.3 mJ/m2。银、金和铜是典型的低层错能金属,其层错能分别为16、32和45 mJ/m2[39]。2H β-In2Se3的层错能比银更低,解释了为什么在2H β-In2Se3中大量存在RSF和SSF堆垛层错。RSF只改变最近邻而不改变次近邻QL的堆垛关系,而SSF不仅改变了最近邻也改变了次近邻的QL堆垛关系,这是后者的层错能比前者高的原因。tISF的堆垛层错能(99.9 mJ/m2)比铜的高,因此难以出现在2H β-In2Se3中。值得注意的是,ISF和tSSF的堆垛层错能分别为-13.3和-28.8 mJ/m2,表明2H相在生长过程中容易自发形成ISF和tSSF堆垛缺陷。这些堆垛缺陷的形成使2H相形成局域的3R堆垛结构,进而形成3R相的生长趋势,解释了图4中的相分离现象。需要指出的是,在上述实验观察中发现:在热力学上易自发形成tSSF,这可能需要根据动力学解释。在3R β-In2Se3相中SSF (tISF)是唯一一种能观察到的堆垛缺陷,局部1T的堆垛构型使其具有较高的堆垛层错能(124.7 mJ/m2),其数值与镁的层错能(125 mJ/m2)相当[39],因此在实验中较为罕见;但是,在实验中并未观察到堆垛层错能比SSF(tISF)更低的rISF(41.2 mJ/m2)。其原因是:一方面,rISF有可能出现在3R β-In2Se3中,但是微观实验观测手段难以遍历材料的所有位置;另一方面,SSF(tISF)的产生可归因于样品在机械剥离过程中受到外力作用而发生的层间滑移。虽然在合成的β-In2Se3晶体中没有出现具有较高形成能的1T相,但是在表1中也给出了基于1T相构建的两种堆垛缺陷模型rISF和SSF。其中在rISF堆垛缺陷模型中形成了局域的2H堆垛结构,如A
为了描述β-In2Se3中QL之间的堆垛关系,提出了一组描述符(
4 结论
(1) 提出了用于描述β-In2Se3层间堆垛关系的描述符(
(2) 三种β-In2Se3相的稳定性依次为3R、2H、1T。在2H β-In2Se3中,观察到三种堆垛层错:RSF、SSF、tSSF,其中RSF和SSF的堆垛层错能较低、层错密度高;tSSF对应的层错能为负值(-28.8 mJ/m2),是一种在热力学上易自发形成的堆垛层错;tISF的层错能较高,尚未在实验中观察到。在3R β-In2Se3中只观察到一种堆垛层错能较高的SSF(tISF),其存在可归因于在机械剥离过程中样品受到外力所致。首次观察到2H与3R β-In2Se3的相界面结构。
(3) 传统意义上的内禀层错和外禀层错不适用于描述β-In2Se3堆垛缺陷的结构本质,需建立规范统一的分类术语描述类van der Waals层状材料堆垛缺陷的结构特征。
参考文献
Phase engineering of nanomaterials
[J].Phase has emerged as an important structural parameter - in addition to composition, morphology, architecture, facet, size and dimensionality - that determines the properties and functionalities of nanomaterials. In particular, unconventional phases in nanomaterials that are unattainable in the bulk state can potentially endow nanomaterials with intriguing properties and innovative applications. Great progress has been made in the phase engineering of nanomaterials (PEN), including synthesis of nanomaterials with unconventional phases and phase transformation of nanomaterials. This Review provides an overview on the recent progress in PEN. We discuss various strategies used to synthesize nanomaterials with unconventional phases and induce phase transformation of nanomaterials, by taking noble metals and layered transition metal dichalcogenides as typical examples. Moreover, we also highlight recent advances in the preparation of amorphous nanomaterials, amorphous-crystalline and crystal phase-based hetero-nanostructures. We also provide personal perspectives on challenges and opportunities in this emerging field, including exploration of phase-dependent properties and applications, rational design of phase-based heterostructures and extension of the concept of phase engineering to a wider range of materials.© 2020. Springer Nature Limited.
Charge carriers in few-layer graphene films
[J].
Proximate Kitaev quantum spin liquid behaviour in a honeycomb magnet
[J].Quantum spin liquids (QSLs) are topological states of matter exhibiting remarkable properties such as the capacity to protect quantum information from decoherence. Whereas their featureless ground states have precluded their straightforward experimental identification, excited states are more revealing and particularly interesting owing to the emergence of fundamentally new excitations such as Majorana fermions. Ideal probes of these excitations are inelastic neutron scattering experiments. These we report here for a ruthenium-based material, alpha-RuCl3, continuing a major search (so far concentrated on iridium materials) for realizations of the celebrated Kitaev honeycomb topological QSL. Our measurements confirm the requisite strong spin-orbit coupling and low-temperature magnetic order matching predictions proximate to the QSL. We find stacking faults, inherent to the highly two-dimensional nature of the material, resolve an outstanding puzzle. Crucially, dynamical response measurements above interlayer energy scales are naturally accounted for in terms of deconfinement physics expected for QSLs. Comparing these with recent dynamical calculations involving gauge flux excitations and Majorana fermions of the pure Kitaev model, we propose the excitation spectrum of alpha-RuCl3 as a prime candidate for fractionalized Kitaev physics.
Trilayer graphene is a semimetal with a gate-tunable band overlap
[J].Graphene-based materials are promising candidates for nanoelectronic devices because very high carrier mobilities can be achieved without the use of sophisticated material preparation techniques. However, the carrier mobilities reported for single-layer and bilayer graphene are still less than those reported for graphite crystals at low temperatures, and the optimum number of graphene layers for any given application is currently unclear, because the charge transport properties of samples containing three or more graphene layers have not yet been investigated systematically. Here, we study charge transport through trilayer graphene as a function of carrier density, temperature, and perpendicular electric field. We find that trilayer graphene is a semimetal with a resistivity that decreases with increasing electric field, a behaviour that is markedly different from that of single-layer and bilayer graphene. We show that the phenomenon originates from an overlap between the conduction and valence bands that can be controlled by an electric field, a property that had never previously been observed in any other semimetal. We also determine the effective mass of the charge carriers, and show that it accounts for a large part of the variation in the carrier mobility as the number of layers in the sample is varied.
Stacking-dependent band gap and quantum transport in trilayer graphene
[J].
Transition metal dichalcogenides bilayer single crystals by reverse-flow chemical vapor epitaxy
[J].Epitaxial growth of atomically thin two-dimensional crystals such as transition metal dichalcogenides remains challenging, especially for producing large-size transition metal dichalcogenides bilayer crystals featuring high density of states, carrier mobility and stability at room temperature. Here we achieve in epitaxial growth of the second monolayer from the first monolayer by reverse-flow chemical vapor epitaxy and produce high-quality, large-size transition metal dichalcogenides bilayer crystals with high yield, control, and reliability. Customized temperature profiles and reverse gas flow help activate the first layer without introducing new nucleation centers leading to near-defect-free epitaxial growth of the second layer from the existing nucleation centers. A series of bilayer crystals including MoS and WS, ternary MoWS and quaternary MoWSSe are synthesized with variable structural configurations and tunable electronic and optical properties. The robust, potentially universal approach for the synthesis of large-size transition metal dichalcogenides bilayer single crystals is highly-promising for fundamental studies and technological applications.
Stacking fault enriching the electronic and transport properties of few-layer phosphorenes and black phosphorus
[J].Interface engineering is critical for enriching the electronic and transport properties of two-dimensional materials. Here, we identify a new stacking, named Aδ, in few-layer phosphorenes (FLPs) and black phosphorus (BP) based on first-principles calculation. With its low formation energy, the Aδ stacking could exist in FLPs and BP as a stacking fault. The presence of the Aδ stacking fault induces a direct to indirect transition of the band gap in FLPs. It also affects the carrier mobilities by significantly increasing the carrier effective masses. More importantly, the Aδ stacking enables the fabrication of a whole spectrum of lateral junctions with all the type-I, II, and III alignments simply through the manipulation of the van der Waals stacking without resorting to any chemical modification. This is achieved by the widely tunable electron affinity and ionization potential of FLPs and BP with the Aδ stacking.
Stacking fault induced symmetry breaking in van der waalss nanowires
[J].While traditional ferroelectrics are based on polar crystals in bulk or thin film form, two-dimensional and layered materials can support mechanisms for symmetry breaking between centrosymmetric building blocks, e.g., by creating low-symmetry interfaces in van der Waals stacks. Here, we introduce an approach toward symmetry breaking in van der Waals crystals that relies on the spontaneous incorporation of stacking faults in a nonpolar bulk layer sequence. The concept is realized in nanowires consisting of Se-rich group IV monochalcogenide (GeSeS) alloys, obtained by vapor-liquid-solid growth. The single crystalline wires adopt a layered structure in which the nonpolar A-B bulk stacking along the nanowire axis is interrupted by single-layer stacking faults with local A-A' stacking. Density functional theory explains this behavior by a reduced stacking fault formation energy in GeSe (or Se-rich GeSeS alloys). Computations demonstrate that, similar to monochalcogenide monolayers, the inserted A-layers should show a spontaneous electric polarization with a switching barrier consistent with a Curie temperature above room temperature. Second-harmonic generation signals are consistent with a variable density of stacking faults along the wires. Our results point to possible routes for designing ferroelectrics via the layer stacking in van der Waals crystals.
Enhancement of interlayer exchange in an ultrathin two-dimensional magnet
[J].
Low-dimensional In2Se3 compounds: from material preparations to device applications
[J].
Controllable growth and characterization of polymorphic layered In2Se3 and its heterostructure
[D].
多晶型层状In2Se3及其异质结的可控制备和表征
[D].
Layer-dependent ferroelectricity in 2H-stacked few-layer alpha-In2Se3
[J].
Intrinsic two-dimensional ferroelectricity with dipole locking
[J].
Intercorrelated in-plane and out-of-plane ferroelectricity in ultrathin two-dimensional layered semiconductor In2Se3
[J].
Prediction of intrinsic two-dimensional ferroelectrics in In2Se3 and other III2-VI3 van der Waalss materials
[J].
Research progress of two-dimensional ferroelectric material of In2Se3
[J].
二维铁电材料In2Se3的研究进展
[J].
Multidirection piezoelectricity in mono- and multilayered hexagonal alpha-In2Se3
[J].
Giant pyroelectricity in nanomembranes
[J].
High responsivity and photovoltaic effect based on vertical transport in multilayer α‐In2Se3
[J].
Nonvolatile ferroelectric memory effect in ultrathin α-In2Se3
[J].
A ferroelectric semiconductor field-effect transistor
[J].
Asymmetric metal/alpha-In2Se3/Si crossbar ferroelectric semiconductor junction
[J].
Phase-defined van der waals schottky junctions with significantly enhanced thermoelectric properties
[J].We demonstrate a van der Waals Schottky junction defined by crystalline phases of multilayer InSe. Besides ideal diode behaviors and the gate-tunable current rectification, the thermoelectric power is significantly enhanced in these junctions by more than three orders of magnitude compared with single-phase multilayer InSe, with the thermoelectric figure-of-merit approaching ∼1 at room temperature. Our results suggest that these significantly improved thermoelectric properties are not due to the 2D quantum confinement effects but instead are a consequence of the Schottky barrier at the junction interface, which leads to hot carrier transport and shifts the balance between thermally and field-driven currents. This "bulk" effect extends the advantages of van der Waals materials beyond the few-layer limit. Adopting such an approach of using energy barriers between van der Waals materials, where the interface states are minimal, is expected to enhance the thermoelectric performance in other 2D materials as well.
Phase-engineering-driven enhanced electronic and optoelectronic performance of multilayer In2Se3 nanosheets
[J].
Colloidal monolayer beta-In2Se3 nanosheets with high photoresponsivity
[J].
Quantum confinement and photoresponsivity of β-In2Se3 nanosheets grown by physical vapour transport
[J].
Two-dimensional ferroelasticity in van der waalss beta'-In2Se3
[J].
Two-dimensional antiferroelectricity in nanostripe-ordered In2Se3
[J].
Chemical vapor transport reactions for synthesizing layered materials and their 2D counterparts
[J].
Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set
[J].
Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set
[J],
Projector augmented-wave method
[J].
Generalized gradient approximation made simple
[J].
Effect of the damping function in dispersion corrected density functional theory
[J].It is shown by an extensive benchmark on molecular energy data that the mathematical form of the damping function in DFT-D methods has only a minor impact on the quality of the results. For 12 different functionals, a standard "zero-damping" formula and rational damping to finite values for small interatomic distances according to Becke and Johnson (BJ-damping) has been tested. The same (DFT-D3) scheme for the computation of the dispersion coefficients is used. The BJ-damping requires one fit parameter more for each functional (three instead of two) but has the advantage of avoiding repulsive interatomic forces at shorter distances. With BJ-damping better results for nonbonded distances and more clear effects of intramolecular dispersion in four representative molecular structures are found. For the noncovalently-bonded structures in the S22 set, both schemes lead to very similar intermolecular distances. For noncovalent interaction energies BJ-damping performs slightly better but both variants can be recommended in general. The exception to this is Hartree-Fock that can be recommended only in the BJ-variant and which is then close to the accuracy of corrected GGAs for non-covalent interactions. According to the thermodynamic benchmarks BJ-damping is more accurate especially for medium-range electron correlation problems and only small and practically insignificant double-counting effects are observed. It seems to provide a physically correct short-range behavior of correlation/dispersion even with unmodified standard functionals. In any case, the differences between the two methods are much smaller than the overall dispersion effect and often also smaller than the influence of the underlying density functional.Copyright © 2011 Wiley Periodicals, Inc.
A consistent and accurate ab initio parametrization of density functional dispersion correction (DFT-D) for the 94 elements H-Pu
[J].
Intrinsic stacking faults in body-centred cubic crystals
[J].
High-pressure torsion of pure metals: Influence of atomic bond parameters and stacking fault energy on grain size and correlation with hardness
[J].
Impact of bonding on the stacking defects in layered chalcogenides
[J].
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