材料研究学报, 2024, 38(5): 330-336 DOI: 10.11901/1005.3093.2023.260

研究论文

β-In2Se3 堆垛缺陷的电子显微学研究

王强1, 朱鹤雨2,3, 刘志博,2,3, 朱毅2,3, 刘培涛2,3, 任文才2,3

1.沈阳化工大学材料科学与工程学院 沈阳 110142

2.中国科学院金属研究所 沈阳材料科学国家研究中心 沈阳 110016

3.中国科学技术大学材料科学与工程学院 沈阳 110016

Electron Microscopy Study of Stacking Defects in β-In2Se3

WANG Qiang1, ZHU Heyu2,3, LIU Zhibo,2,3, ZHU Yi2,3, LIU Peitao2,3, REN Wencai2,3

1.School of Materials Science and Engineering, Shenyang University of Chemical Technology, Shenyang 110142, China

2.Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China

3.School of Materials Science and Engineering, University of Science and Technology of China, Shenyang 110016, China

通讯作者: 刘志博,副研究员,zbliu@imr.ac.cn,研究方向为二维材料电子显微学

责任编辑: 黄青

收稿日期: 2023-05-15   修回日期: 2023-10-21  

基金资助: 国家自然科学基金(52272050)
中国科学院青年创新促进会(2021000185)
沈阳材料科学国家研究中心青年人才项目(2019000191)

Corresponding authors: LIU Zhibo, Tel: 18809896512, E-mail:zbliu@imr.ac.cn

Received: 2023-05-15   Revised: 2023-10-21  

Fund supported: National Natural Science Foundation of China(52272050)
Youth Innovation Promotion Association CAS(2021000185)
Young Talents Project of Shenyang National Laboratory for Materials Science(2019000191)

作者简介 About authors

王 强,男,1997年生,硕士生

摘要

基于像差校正扫描透射电子显微学和第一性原理计算,研究了van der Waals(范德瓦尔斯)层状β-In2Se3中堆垛缺陷的原子构型。结果表明,在2H β-In2Se3中存在大量的置换型层错(RSF)和滑移型层错(SSF),发现了一种在热力学上易自发形成的T相滑移型堆垛层错(tSSF);在3R β-In2Se3中只观察到一种能量较高的滑移型层错;2H和3R β-In2Se3以界面连续过渡的方式发生相分离。本文还构建9种β-In2Se3潜在的堆垛层错构型,并计算了相应的堆垛层错能并从能量角度分析了堆垛层错的成因。最后,指出建立分类术语描述类van der Waals层状材料堆垛层错的必要性。

关键词: 无机非金属材料; 堆垛层错; β-In2Se3; HAADF-STEM; 第一性原理计算

Abstract

In2Se3 has recently received much attention because of its excellent ferroelectric, thermoelectric, and photoelectric properties. However, the stacking defects, known as an important factor affecting the properties of van der Waals layered materials, have not yet been explored for In2Se3. Herein, the atomic configurations of stacking defects in van der Waals layered β-In2Se3 were studied by means of aberration-corrected scanning transmission electron microscopy combined with first-principles calculations. There are a significant amount of replacement-type stacking faults (RSFs) and slip-type stacking faults (SSFs) in 2H β-In2Se3. Moreover, the 1T phase slip-type stacking fault (tSSF), which is thermodynamically prone to spontaneous formation, was observed in 2H β-In2Se3. However, only the SSF was observed as a high energy configuration in 3R β-In2Se3. The phase separation occurred between 2H and 3R β-In2Se3 with a coherent stacking interface. In addition, nine potential stacking fault configurations of β-In2Se3 were constructed, the corresponding stacking fault energies were calculated, and the causes of stacking faults were analyzed from an energetic perspective. Finally, the need for a classification term describing the stacking faults in van der Waals-like layered materials is pointed out.

Keywords: inorganic nonmetallic materials; stacking fault; β-In2Se3; HAADF-STEM; first-principles calculations

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本文引用格式

王强, 朱鹤雨, 刘志博, 朱毅, 刘培涛, 任文才. β-In2Se3 堆垛缺陷的电子显微学研究[J]. 材料研究学报, 2024, 38(5): 330-336 DOI:10.11901/1005.3093.2023.260

WANG Qiang, ZHU Heyu, LIU Zhibo, ZHU Yi, LIU Peitao, REN Wencai. Electron Microscopy Study of Stacking Defects in β-In2Se3[J]. Chinese Journal of Materials Research, 2024, 38(5): 330-336 DOI:10.11901/1005.3093.2023.260

Van der Waals(vdW,范德瓦尔斯)层状材料,是一类层内原子通过共价键结合、层间为范德瓦尔斯相互作用的材料。1T(AA)、2H(AB)和3R(ABC)是vdW层状材料常见的三种堆垛构型[1]。当堆垛构型改变时,层与层之间的耦合作用也相应改变,从而赋予材料新的物理性质[2~9]。例如,ABA堆垛的三层石墨烯是零带隙半金属,而ABC堆垛的三层石墨烯是带隙可调谐的半导体[4,5];AA堆垛的双层二硫化钼比AB堆垛构型具有更高的开/关比[6];作为晶体缺陷,堆垛层错能使少层磷烯发生从直接带隙到间接带隙的转变[7]、破坏GeSe的对称性而使其产生铁电性[8]、也能加强CrI3的层间耦合作用[9]

In2Se3是一种多形体材料,主要含有αβγδκ五种相结构[10,11],其中α-和β-In2Se3是常见且稳定的vdW层状材料。由于α-In2Se3具有面内面外耦合的铁电性[12~16]、压电性[17]、高热释电系数[18]和高光响应性[19],近年来备受关注,在铁电场效应晶体管[20~22]、热电转换[23]和光电探测[19]等领域有极大的应用潜力。与α-In2Se3相比,β-In2Se3具有更高的电子迁移率[24],更高的光响应率[25]和更短的光响应时间[26],优于大多数二维材料基光电探测器。同时,研究人员发现β-In2Se3的结构畸变能诱发产生面内反铁电性和铁弹性[27,28]。因此,作为In2Se3的家族成员,β-In2Se3也越来越受到人们的关注。作为在van der Waals层状材料中普遍存在的晶体缺陷,堆垛层错将破坏β-In2Se3原子排列的周期性和局域对称性,从而对电学、光电、铁电和铁弹等诸多物理性质产生潜在影响。但是迄今为止,这种堆垛缺陷的原子级构型尚未在β-In2Se3中得以揭示。鉴于此,本文基于像差校正扫描透射电子显微学(STEM)结合第一性原理计算系统研究van der Waals层状材料β-In2Se3堆垛缺陷的原子结构,构建堆垛层错构型和计算堆垛层错能,并从能量角度分析β-In2Se3堆垛层错的成因。

1 实验方法

1.1 电子显微学结构解析

用化学气相输运(CVT)法制备块体β-In2Se3样品[29]。用微机械剥离法将少层β-In2Se3从大块样品上剥离到SiO2/Si衬底上,少层β-In2Se3样品暴露的边缘多为能量低的低指数晶体学面{1 1¯ 0 0},相应地沿着样品边缘的晶体学方向为<1 1 2¯ 0>;用Tescan LYRA 3 XMU聚焦离子束显微镜(FIB)沿垂直于样品边缘的方向切样,制备透射电子显微镜(TEM)截面样品,得到能观察β-In2Se3层间堆垛方式的<1 1 2¯ 0>晶体取向。在实际制样过程中,选择长直边作为取样的参考方位。同时,为了在TEM中高效快速地转正样品取向,截面样品的<1 1 2¯ 0>方向须与TEM样品杆的轴向重合。

实验用透射电镜的型号为FEI Titan cubic Themis G2 300,操作电压300 kV,配备高亮度场发射枪(X-FEG)、双球差校正器、四探头超级能谱仪以及GIF能量过滤系统。采用高角环形暗场-扫描透射电子显微学(HAADF-STEM)方式成像,相机的长度和会聚半角分别为115 mm和29.4 mrad,收集半角为47~200 mrad,束流为35 pA。

1.2 第一性原理计算

使用软件包VASP进行全部第一性原理计算[30,31]。用投影缀加平面波方法描述赝势[32]。采用Perdew-Burke-Ernzerhof(PBE)参数化的广义梯度近似描述电子与离子之间的交换关联作用[33]。经系统收敛测试,平面波截断能设为420 eV,k点网格设为以Γ为中心的15 × 15 × 1。进行结构弛豫和自洽计算时,体系的总能和离子的Hellman-Feynman力的收敛标准分别设置为10-6 eV和0.1 eV/nm。用展宽为0.05 eV的Gaussian方法描述电子占据。用DFT-D3方法描述van der Waals相互作用[34,35]

2 实验结果

图1中的HAADF-STEM图像显示了2H和3R β-In2Se3在原子尺度上的本征堆垛构型。在HAADF-STEM图像中In和Se原子表现出不同的强度,近似与原子序数的平方成正比(~Z 2)[36]β-In2Se3是一种具有Se-In-Se-In-Se结构的五原子层(QL)范德瓦尔斯层状材料,其中In原子位于Se八面体中。2H β-In2Se3呈现abcab/cbacb¯的之字形堆垛构型,其空间群为P63mc,字母上方的负号表示β-In2Se3原子层旋转了180°。3R β-In2Se3呈现abcab/cabca/bcabc的堆垛构型,其空间群为R3¯m。为了便于描述层间堆垛顺序引入了新的描述符,将中心Se原子层的位置符号定义为每层β-In2Se3的位置。因此,将2H β-In2Se3abcab/cbacb¯排列描述为CA¯,将3R β-In2Se3abcab/cabca/bcabc排列描述为CBA。根据这一描述并根据β-In2Se3的八面体结构,AA¯BB¯CC¯A¯AB¯BC¯CABBCCABA¯CB¯AC¯的堆垛构型表现出van der Waals间隙两侧的Se原子面沿c轴方向完全对中,使QL-QL相互作用减弱和体系的总能量增加。作为例证,2H相展现出CA¯CA¯CA¯排列而不是ABABAB排列。因此,上述Se原子对中的高能量堆垛构型不在本文的讨论范围之内。

图1

图1   2H和3R β-In2Se3的本征堆垛结构

Fig.1   Intrinsic stacking sequence of 2H and 3R β-In2Se3. (a) Atomic-scale HAADF-STEM image of the 2H β-In2Se3 with the stacking sequence of A¯CA¯C viewing at [1¯ 2 1¯ 0] zone axis. (b) Atomic-scale HAADF-STEM image of the 3R β-In2Se3with the stacking sequence of CBAC viewing at [2¯ 1 1 0] zone axis


图2a给出了2H β-In2Se3的低倍截面HAADF-STEM图像,插图给出了相应的快速傅里叶变换(FFT)谱。该FFT谱沿着c轴方向出现拉线,表明2H β-In2Se3存在堆垛缺陷。为了揭示堆垛缺陷的结构特征,在样品的不同位置拍摄了一系列原子尺度HAADF-STEM图像。图2b给出的堆垛构型为A¯CA¯BA¯C,其中一个原始的C层被B层取代,这种堆垛缺陷定义为置换型堆垛层错(RSF)。图2c给出了A¯C|B¯AB¯AB¯|CA¯C的堆垛构型,其中B¯AB¯AB¯是相对于A¯CA¯CA¯的原始堆垛方式滑动一个1/3 <1 1¯ 0 0>矢量生成的,竖线表示堆垛缺陷的位置,这种堆垛缺陷定义为滑移型堆垛层错(SSF)。图2d中的HAADF-STEM图像显示出2H β-In2Se3含有高密度的RSF和SSF,其位置分别用黑色和蓝色虚线表示,表明RSF和SSF是2H β-In2Se3中常见的堆垛缺陷。但是,没有观察到诸如A¯CA¯CCA¯CA¯A¯CA¯CBA¯CA¯的堆垛构型,它们可通过在CA¯的本征堆垛序列中额外插入一层CB而生成,但是会破坏2H β-In2Se3的之字形结构。这种堆垛缺陷,定义为插入型堆垛层错(ISF)。为了区分二者的差别,将A¯CA¯CCA¯CA¯中的ISF指定为T相插入型堆垛层错(tISF),源于局域的CC堆垛恰是1T β-In2Se3的本征堆垛方式。但是,有一种特殊的层错出现在2H β-In2Se3中,如图2e所示,其构型为C¯BC¯BC¯|A¯CA¯CA¯,可视为在C¯BC¯BC¯|C¯BC¯BC¯(tISF)构型的基础上滑移一个矢量1/3 <1 1¯ 0 0>而生成,因此将这种堆垛缺陷命名为T相滑移型堆垛层错(tSSF)。

图2

图2   2H β-In2Se3的堆垛层错结构

Fig.2   Stacking fault of 2H β-In2Se3 (a) A low-magnification cross-sectional HAADF-STEM image of the 2H β-In2Se3. The inset is the corresponding FFT patten, (b) Atomic-scale HAADF-STEM image of 2H β-In2Se3 with a RSF indicated by the black dashed line, (c) Atomic-scale HAADF-STEM image of 2H β-In2Se3 with SSFs indicated by the blue dashed lines, (d) Atomic-scale HAADF-STEM image of 2H β-In2Se3 with a high density of RSFs and SSFs. The positions of RSFs and SSFs are denoted by the black and blue dashed lines, respectively, (e) Atomic-scale HAADF-STEM image of 2H β-In2Se3 with a tSSF indicated by the red dashed line


图3给出了3R β-In2Se3原子尺度的HAADF-STEM图像,显示出CBAC|CBAC的堆垛构型,其中也存在局域的CC排列。因此,这种堆垛缺陷也具有明显的tISF特征。需要指出的是,这种3R相中的tISF也是一种SSF,因为CBAC|CBAC也可看成是CBACBACB在箭头两侧发生1/3<1 1¯ 0 0>的相对滑移而得。但是,SSF(tISF)在3R β-In2Se3样品中出现的频次较低。如果在CBACBA中插入B¯层则其堆垛序列将变为CBA|B¯|CBA。这种堆垛缺陷定义为逆向插入型堆垛层错(rISF),但是在实验中尚未观察到。

图3

图3   3R β-In2Se3的堆垛层错结构

Fig.3   Atomic-scale HAADF-STEM image of the 3R β-In2Se3 with a SSF (tISF) denoted by the blue dashed line


图4a表明,在2H β-In2Se3晶体的局部区域(FIB截面样品的表面)出现了3R相的堆垛形式。原子尺度的HAADF-STEM图像显示,界面附近的构型为ACBACA¯CA¯C(图4b),图中箭头指示的C层为两相共享界面层,它不改变界面附近QL的最近邻堆垛关系,实现界面的自然连续过渡。2H和3R β-In2Se3的相界面构型,也首次在原子尺度上揭示。值得注意的是,ISF可使2H β-In2Se3出现局部的3R堆垛构型,如A¯CA¯CBA¯CA¯构型所示,因此在晶体生长过程中ISF可能从2H相诱发分离出3R相。

图4

图4   2H和3R β-In2Se3的界面结构

Fig.4   Interface structure of 2H and 3R β-In2Se3 (a) The formation of 3R β-In2Se3 on 2H phase,(b) Atomic-scale HAADF-STEM image of the interface structure between 2H and 3R β-In2Se3


为了评估β-In2Se3的层错特性,应用第一性原理计算了3R、2H和1T β-In2Se3中不同堆垛缺陷的堆垛层错能(SFE)。与金属的广义层错能的定义相似[37],van der Waals层状β-In2Se3的堆垛层错能定义为形成单位面积层错所需要的能量[38],其表达式为

γ=ESF-E0n×A

式中ESFE0分别为含有和不含有堆垛缺陷的超胞的总能量,A为堆垛层错面的面积,n为堆垛层错面的个数。表1列出了9种β-In2Se3的堆垛层错构型及其堆垛层错能,堆垛构型均为12层QL超胞,层错面的位置均用符号“|”标记。同时,根据第一性原理计算出3R、2H和1T β-In2Se3的形成能分别为-30.86、-30.67和-30.22 eV。这表明,3R相最稳定,2H相次之,而1T相的稳定性最低;计算出的超胞c轴晶格常数也列在表1中。可以看出,1T相堆垛构型的晶格常数最大,2H相次之,3R相最小,表明层间相互作用依次增强。上述两点解释了在合成的β-In2Se3中只观察到2H和3R相而没有观察到1T相的原因,与1T相很少被报道的结果一致。3R相的堆垛层错密度低于2H相的实验观测结果,也可根据相稳定性和层间相互作用得以说明。

表1   β-In2Se3的层错构型及其对应的堆垛层错能

Table 1  Stacking fault configurations and corresponding SFEs of β-In2Se3

ConfigurationStacking faultc / nmnSFE / mJ·m-2
A¯CA¯CA¯CA¯CA¯CA¯C2H β-In2Se311.057--
A¯CA¯C|CA¯CA¯CA¯|A¯CtISF11.067299.9
A¯CA¯CA¯|B|A¯CA¯CA¯CRSF11.05426.3
A¯CA¯C|B¯AB¯AB¯|CA¯CSSF11.056211.3
A¯CA¯C|B|A¯CA¯C|B|A¯CISF11.0204-13.3
BC¯BC¯BC¯|A¯CA¯CA¯C|tSSF11.0242-28.8
CBACBACBACBA3R β-In2Se310.935--
CBAC|CBAC|CBAC|SSF(tISF)10.9993124.7
CBA|B¯|CBA|B¯|CBA|B¯|rISF10.984641.2
AAAAAAAAAAAA1T β-In2Se311.234--
AAAAAA|B¯|AAAAArISF11.2342-49.2
AAAA|CCCC|BBBB|SSF11.1573-107.5

Note: SFEstacking fault energy, c—lattice parameter of supercell along c-axis direction, n—the number of stacking fault planes

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3 讨论

在2H β-In2Se3中,RSF和SSF的堆垛层错能分别为6.3和11.3 mJ/m2。银、金和铜是典型的低层错能金属,其层错能分别为16、32和45 mJ/m2[39]。2H β-In2Se3的层错能比银更低,解释了为什么在2H β-In2Se3中大量存在RSF和SSF堆垛层错。RSF只改变最近邻而不改变次近邻QL的堆垛关系,而SSF不仅改变了最近邻也改变了次近邻的QL堆垛关系,这是后者的层错能比前者高的原因。tISF的堆垛层错能(99.9 mJ/m2)比铜的高,因此难以出现在2H β-In2Se3中。值得注意的是,ISF和tSSF的堆垛层错能分别为-13.3和-28.8 mJ/m2,表明2H相在生长过程中容易自发形成ISF和tSSF堆垛缺陷。这些堆垛缺陷的形成使2H相形成局域的3R堆垛结构,进而形成3R相的生长趋势,解释了图4中的相分离现象。需要指出的是,在上述实验观察中发现:在热力学上易自发形成tSSF,这可能需要根据动力学解释。在3R β-In2Se3相中SSF (tISF)是唯一一种能观察到的堆垛缺陷,局部1T的堆垛构型使其具有较高的堆垛层错能(124.7 mJ/m2),其数值与镁的层错能(125 mJ/m2)相当[39],因此在实验中较为罕见;但是,在实验中并未观察到堆垛层错能比SSF(tISF)更低的rISF(41.2 mJ/m2)。其原因是:一方面,rISF有可能出现在3R β-In2Se3中,但是微观实验观测手段难以遍历材料的所有位置;另一方面,SSF(tISF)的产生可归因于样品在机械剥离过程中受到外力作用而发生的层间滑移。虽然在合成的β-In2Se3晶体中没有出现具有较高形成能的1T相,但是在表1中也给出了基于1T相构建的两种堆垛缺陷模型rISF和SSF。其中在rISF堆垛缺陷模型中形成了局域的2H堆垛结构,如AB¯A;在SSF堆垛缺陷模型中形成了局域的3R堆垛结构,如ACCBBA。计算结果表明,rISF和SSF的堆垛层错能分别为-49.2 mJ/m2和-107.5 mJ/m2。这表明,在晶体生长过程中rISF和SSF可自发生成,从而促进1T相向2H或3R相转变。与3R相比2H相更稳定,因此SSF诱发1T相转化为3R相的热力学趋势极为明显。

为了描述β-In2Se3中QL之间的堆垛关系,提出了一组描述符(ABCA¯B¯C¯),每个描述符代表一层β-In2Se3,具有特定的规则建立彼此之间的堆垛关系。但是,当QL变成其他多原子层(ML)van der Waals层状材料时,相应描述符的堆垛规则也随之改变。在传统上,ABAB堆垛序列是一种诸如镁和锌的密排六方结构,而ABCABC堆垛序列对应诸如银、金和铜的面心立方结构。在这些紧密堆积的晶体体系中,层错分为内禀层错和外禀层错。内禀层错可视为在晶体中抽出一层原子所得或为晶粒内两部分发生相对滑移引起的,而外禀层错可视为在晶体中插入一层原子[40]。但是,这种基于单原子层定义的内禀层错和外禀层错,并不适用于描述β-In2Se3这种多原子层van der Waals层状材料堆垛缺陷的堆垛关系。例如,在2H β-In2Se3中的A¯CA¯BA¯C构型就无法用内禀或外禀层错反应其堆垛缺陷的结构特性;相反,在2H β-In2Se3中的tISF和在3R β-In2Se3中的SSF (tISF)不仅可描述为内禀层错,也可描述为外禀层错,这对传统意义上层错的分类提出了挑战。尽管研究人员提出了平移切变层错(Translational shear fault)的概念描述类van der Waals层状材料中ML的滑移行为[41],但是这种概念囊括了所有类van der Waals层状材料中的堆垛层错,无法区分不同堆垛层错之间的结构特征。因此,为了研究类van der Waals层状材料中堆垛缺陷结构特征,需要建立规范和普适的分类术语。

4 结论

(1) 提出了用于描述β-In2Se3层间堆垛关系的描述符(ABCA¯B¯C¯),定义了6种堆垛层错的结构类型,分别为T相插入型堆垛层错(tISF)、置换型堆垛层错(RSF)、滑移型堆垛层错(SSF)、插入型堆垛层错(ISF)、T相滑移型堆垛层错(tSSF)、反向插入型堆垛层错(rISF)。

(2) 三种β-In2Se3相的稳定性依次为3R、2H、1T。在2H β-In2Se3中,观察到三种堆垛层错:RSF、SSF、tSSF,其中RSF和SSF的堆垛层错能较低、层错密度高;tSSF对应的层错能为负值(-28.8 mJ/m2),是一种在热力学上易自发形成的堆垛层错;tISF的层错能较高,尚未在实验中观察到。在3R β-In2Se3中只观察到一种堆垛层错能较高的SSF(tISF),其存在可归因于在机械剥离过程中样品受到外力所致。首次观察到2H与3R β-In2Se3的相界面结构。

(3) 传统意义上的内禀层错和外禀层错不适用于描述β-In2Se3堆垛缺陷的结构本质,需建立规范统一的分类术语描述类van der Waals层状材料堆垛缺陷的结构特征。

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