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Chin J Mater Res  1997, Vol. 11 Issue (5): 507-510    DOI:
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EFFECT OF REACTIVELY-SPUTTERED Al_2O_3 FILMS ON OXIDATION RESISTANCE OF TiAl
TANG Zhaolin; WANG Fuhui; WU Weitao(State key Lab for Corrosion and Protection. Young Scientists Lab of Sur face Engineering; Institute ofCorrosion and Protection of Metals; The Chinese Academy of Sciences)
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TANG Zhaolin; WANG Fuhui; WU Weitao(State key Lab for Corrosion and Protection. Young Scientists Lab of Sur face Engineering; Institute ofCorrosion and Protection of Metals; The Chinese Academy of Sciences). EFFECT OF REACTIVELY-SPUTTERED Al_2O_3 FILMS ON OXIDATION RESISTANCE OF TiAl. Chin J Mater Res, 1997, 11(5): 507-510.

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Abstract  Effect of reactively-sputtered Al2O3 film on oxidation resistance of TiAl intermetallics was studied at 800~ 1000℃ in static air. The results showed that Al2O3 film improved the oxidation resistance of TiAl remarkably at 800 and 900℃. At 800℃, the Al2O3 f
Key words:  Al_2O_3 film TiAl intermetallics oxidation     
Received:  25 October 1997     
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